Characterization of ferromagnetic shape-memory alloy Ni2MnGa deposited by RF magnetron sputtering

Plasma Processes and Polymers

Volumn 4, Issue SUPPL.1, 2007, Pages

  Bernard, Florent ^a   Rousselot, Christophe ^a   Hirsinger, Laurent ^a   Delobelle, Patrick ^a  

^a UNIVERSITÉ DE FRANCHE COMTÉ   (France)

Author keywords

Heat treatment; Shape memory alloys; Sputtering; Stress; Thin films

Indexed keywords

ANNEALING TEMPERATURES; CRYSTALLOGRAPHIC STRUCTURE; DEFLECTION MEASUREMENT; DEPOSITION TEMPERATURES; FERROMAGNETIC SHAPE MEMORY; FERROMAGNETIC SHAPE-MEMORY ALLOYS; RADIO FREQUENCY MAGNETRON SPUTTERING; RF-MAGNETRON SPUTTERING; ROOM TEMPERATURE; SHAPE-MEMORY ALLOYS; SILICON SUBSTRATES; SINGLE BEAM; SPUTTERING CONDITIONS; SPUTTERING PARAMETERS;

ATOMIC FORCE MICROSCOPY; FERROMAGNETIC MATERIALS; FERROMAGNETISM; GALLIUM; HEAT TREATMENT; MAGNETRON SPUTTERING; MAGNETRONS; MANGANESE; MANGANESE COMPOUNDS; NANOCANTILEVERS; NICKEL; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SHAPE MEMORY EFFECT; SILICON ALLOYS; SINGLE CRYSTALS; THERMAL EFFECTS; THIN FILMS;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 69549112177     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200732003     Document Type: Conference Paper

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