Nanoindentation and nanoscratch behaviour of reactive sputtered deposited W-S-C film

Thin Solid Films

Volumn 518, Issue 1, 2009, Pages 185-193

  Koch, T ^a   Evaristo, M ^b   Pauschitz, A ^c   Roy, Manish ^c   Cavaleiro, A ^b  

^a VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

^b UNIVERSITY OF COIMBRA   (Portugal)

^c AC2T RESEARCH GMBH   (Austria)

Author keywords

Carbon; Chalcogenides; Hardness; Mechanical properties; Scanning electron microscopy; Sputtering; X ray diffraction

Indexed keywords

APPLIED LOADS; C FILMS; CARBON-BASED; CONSTANT LOADS; DEFORMATION AND FRACTURE; DISPLACEMENT CURVE; ENVIRONMENTAL CONDITIONS; FRICTION AND WEAR PERFORMANCE; FRICTION COEFFICIENTS; LAYERED STRUCTURES; LOAD EFFECTS; LOAD RANGE; LOAD-DISPLACEMENT CURVE; MAXIMUM HARDNESS; MECHANICAL AND TRIBOLOGICAL PROPERTIES; MICRO-MECHANICAL; MICROELECTROMECHANICAL SYSTEMS; MILLI-NEWTON; MILLINEWTON RANGE; NANO-SCRATCH; RADIO FREQUENCY MAGNETRON SPUTTERING; SELF-LUBRICATING; SIZE EFFECTS; SUBSTRATE EFFECTS; TRANSITION METAL DICHALCOGENIDES; TRIBOLOGICAL BEHAVIOUR;

CHALCOGENIDES; DIFFRACTION; FRICTION; HARDNESS; MECHANICAL PROPERTIES; MECHANISMS; SCANNING; SCANNING ELECTRON MICROSCOPY; STRUCTURAL METALS; TRANSITION METALS; TRIBOLOGY; X RAY DIFFRACTION;

CARBON FILMS;

EID: 69549128078     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.06.027     Document Type: Article

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