Chemical and physical characterization of C(N)-doped W-S sputtered films

Journal of Materials Research

Volumn 19, Issue 8, 2004, Pages 2356-2365

  Nossa, A ^a   Cavaleiro, A ^b  

^a POLYTECHNIC INSTITUTE OF GUARDA   (Portugal)

^b UNIVERSITY OF COIMBRA   (Portugal)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; CARBON; CHEMICAL BONDS; COMPOSITION; CRYSTAL STRUCTURE; DOPING (ADDITIVES); MAGNETRON SPUTTERING; MORPHOLOGY; NITROGEN; SURFACES; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS STRUCTURE; ATOMIC BONDING; CROSS SECTION MORPHOLOGY; SPUTTERED FILMS;

TUNGSTEN ALLOYS;

EID: 4644304439     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.2004.0293     Document Type: Article

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