Study of a supersonic thermal plasma expansion process for synthesis of nanostructured TiO2

Thin Solid Films

Volumn 518, Issue 1, 2009, Pages 84-90

  Kakati, M ^a   Bora, B ^b   Deshpande, U P ^c   Phase, D M ^c   Sathe, V ^c   Lalla, N P ^c   Shripathi, T ^c   Sarma, S ^d   Joshi, N K ^e   Das, A K ^e  

^a DIBRUGARH UNIVERSITY   (India)

^b Centre of Plasma Physics   (India)

^c UGC DAE CONSORTIUM FOR SCIENTIFIC RESEARCH   (India)

^d INDIAN INSTITUTE OF TECHNOLOGY GUWAHATI   (India)

^e BHABHA ATOMIC RESEARCH CENTRE   (India)

Author keywords

Nanoparticles; Optical Emission Spectroscopy; Thermal plasma; Titania

Indexed keywords

CHEMICAL ROUTES; CHEMICAL SYNTHESIS; CONTINUOUS PROCESS; FEED-RATES; GRAIN STRUCTURES; MONODISPERSED NANOPARTICLES; NANOCRYSTALLINES; NANOSTRUCTURED TIO; PARTICLE CHARGING; PHASE TRANSFORMATION; POROUS COATINGS; SINGLE-STEP; THERMAL PLASMA; TIO; TITANIA;

EMISSION SPECTROSCOPY; LIGHT EMISSION; LIGHT TRANSMISSION; NANOPARTICLES; PHOTORESISTS; PLASMAS; SYNTHESIS (CHEMICAL); THERMAL EXPANSION; TITANIUM DIOXIDE; TITANIUM OXIDES;

OPTICAL EMISSION SPECTROSCOPY;

EID: 69549086469     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.06.036     Document Type: Article

References (42)

1. Liang C., Shimizu Y., Sasaki T., and Koshizaki N. Appl. Phys. A 80 (2005) 819
2. Gao L., and Zhang Q. Scripta Mater. 44 (2001) 1195
3. Oh S.M., and Ishigaki T. Thin Solid Films 457 (2004) 186
4. Kakati M., Bora B., Sarma S., Sripathi T., Deshpande U., Dubey A., Ghosh G., and Das A.K. Vacuum 82 (2008) 833
5. Kitazawa S. Jpn. J. Appl. Phys. 43 (2004) 6335
6. Ohshima T., Nakashima S., Ueda T., Kawasaki H., Suda Y., and Ebihara K. Thin Solid Films 506-507 (2006) 106
7. Thareja R.K., and Sharma A.K. Laser Part. Beams 24 (2006) 311
8. Belkind A., Zhu W., Lopez J., and Becker K. Plasma Sources Sci. Technol. 15 (2006) S17
9. Matsushima Y., Yamazaki T., Maeda K., Noma T., and Suzuki T. J. Am. Ceram. Soc. 89 (2006) 799
10. Nakamura M., Kato S., Aoki T., Sirghi L., and Hatanaka Y. Thin Solid Films 401 (2001) 138
11. Borras A., Cotrino J., and Gonzalez-Elipe A.R. J. Electrochem. Soc. 154 (2007) P152
12. West R.H., Beran G.J.O., Green W.H., and Kraft M. J. Phys. Chem. A 111 (2007) 3560
13. West R.H., Celnik M.S., Inderwildi O.R., Kraft M., Beran G.J.O., and Green W.H. Ind. Eng. Chem. Res. 46 (2007) 6147
14. Karlemo B., Koukkari P., and Paloneimi J. Plasma Chem. Plasma Process. 16 (1996) 59
15. Turino M.A. Sens. Actuators, B 100 (2004) 177
16. Wu J.M., and Huang B. J. Am. Ceram. Soc. 90 (2007) 283
17. Caruso T., Lenardi C., Mazza T., Policicchio A., Bongiorno G., Agostino R.G., Chiarello G., Colavita E., Finetti P., Prince K.C., Ducati C., Piseri P., and Milani P. Surf. Sci. 601 (2007) 2688
18. Barborini E., Kholmanov I.N., Conti A.M., Piseri P., Vinati S., Milani P., and Ducati C. Eur. Phys. J. D. 24 (2003) 277
19. Thimsen E., and Biswas P. AIChE J. 53 (2007) 1727
20. Rao N., Girshick S., Heberlein J., McMurry P., Jones S., Hansen D., and Micheel B. Plasma Chem. Plasma Process. 15 (1995) 581
21. Oh S.M., and Park D.W. Thin Solid Films 386 (2001) 233
22. Joshi N.K., Sahasrabudhe S.N., Sreekumar K.P., and Venkatramani N. Meas. Sci. Technol. 8 (1997) 1146
23. Joshi N.K., Sahasrabudhe S.N., Sreekumar K.P., and Venkatramani N. Eur. Phys. J. D. 26 (2003) 215
24. Oh S.M., Li J.G., and Ishigaki T. J. Mater. Res. 20 (2002) 529
25. Barborini E., Kholmanov I.N., Piseri P., Ducati C., Bottani C.E., and Milani P. Appl. Phys. Lett. 81 (2002) 3052
26. Chazelas C., Coudent J.F., Jarrige J., and Fauchais P. J. Eur. Ceram. Soc. 27 (2007) 947
27. Ulrich G.D. Combust. Sci. Technol. 4 (1971) 47
28. Yoon J.D., Park K.Y., and Jang H.D. Aerosol Sci. Technol. 37 (2003) 621
29. Ostrikov K., and Murphy A.B. J. Phys. D: Appl. Phys. 40 (2007) 2223
30. Girshick S.L., and Chiu C.P. Plasma Chem. Plasma Process. 9 (1989) 355
31. Rajabian M., Gravelle D.V., and Vacquie S. Plasma Chem. Plasma Process. 24 (2004) 285
32. Kakati M., Saikia B.K., Chakraborty M., Goswami K.S., and Bujarbarua S. Phys. Plasmas 7 (2000) 5263
33. Chakraborty M., Kausik S.S., Saikia B.K., Kakati M., and Bujarbarua S. Phys. Plasmas 10 (2003) 554
34. Hazelton R.C. IEEE Transac. Plasma Sci. Technol. 22 (1994) 91
35. Bapat A., Gatti M., Ding Y.P., Campbell S.A., and Kortshagen U. J. Phys. D: Appl. Phys. 40 (2007) 2247
36. Vanamu G., Lester K., Datye A.K., Weigle J.C., Chen C.K., Kelley D., and Phillips J. AIChE J. 50 (2004) 2090
37. Zhu Y., and Ding C. J. Eur. Ceram. Soc. 20 (2002) 127
38. Alexandrescu R. Nanotechnology 15 (2004) 537
39. Han Y., Hong S.H., and Xu K. Mater. Lett. 56 (2002) 744
40. Blum J., Tymiak N., Neuman A., Wong Z., Rao N.P., Girshick S.L., Gerberich W.W., McMurry P.H., and Heberlein J.V.R. J. Nanopart. Res. 1 (1999) 31
41. Pearse R.W.B., and Gaydon A.G. The Identification of Molecular Spectra (1963), Wiley, New York 304
42. Degout D., Kassabji F., and Fauchais P. Plasma Process. Plasma Chem. 4 (1984) 179