The effect of substrate temperature on the properties of nanostructured silicon carbide films deposited by hypersonic plasma particle deposition

Journal of Nanoparticle Research

Volumn 1, Issue 1, 1999, Pages 31-42

  Blum, J ^a   Tymiak, N ^b   Neuman, A ^a   Wong, Z ^a   Rao, N P ^a   Girshick, S L ^a   Gerberich, W W ^b   McMurry, P H ^a   Heberlein, J V R ^a  

^a University of Minnesota   (United States)

^b UNIVERSITY OF MINNESOTA   (United States)

Author keywords

Film hardness; Nanoparticles; Nanostructural film; Particle deposition; Silicon carbide; Thermal plasma

Indexed keywords

EID: 0003172094     PISSN: 13880764     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1010033413357     Document Type: Article

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