Photoluminescence of chemical solution-derived amorphous ZnO layers prepared by low-temperature process

Current Applied Physics

Volumn 10, Issue 1, 2010, Pages 1-4

  Eo, Ik Soo ^a   Hwangbo, Seung ^a   Kim, Jin Tae ^b   Hwang, Kyu Seog ^c  

^a Honam University   (South Korea)

^b Chosun University   (South Korea)

^c Nambu University   (South Korea)

Author keywords

Amorphous pattern; Photoluminescence; ZnO thin film

Indexed keywords

AMORPHOUS PATTERN; AMORPHOUS ZNO; CHEMICAL SOLUTIONS; GROWTH CHARACTERISTIC; LOW-TEMPERATURE PROCESS; NEAR BAND EDGE EMISSIONS; PHOTOLUMINESCENCE SPECTRUM; SCANNING PROBE MICROSCOPE; SODA-LIME SILICA GLASS; VISIBLE EMISSIONS; ZNO THIN FILM;

CHEMICALS; EMISSION SPECTROSCOPY; FILM PREPARATION; FUSED SILICA; METALLIC FILMS; OPTICAL FILMS; OPTICAL PROPERTIES; PHOTOLUMINESCENCE; SEMICONDUCTING FILMS; SEMICONDUCTING ZINC COMPOUNDS; SILICA; THIN FILM DEVICES; THIN FILMS; X RAY DIFFRACTION ANALYSIS; ZINC OXIDE;

AMORPHOUS FILMS;

EID: 69249215441     PISSN: 15671739     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cap.2009.04.002     Document Type: Article

References (21)

1. Hwang K.S., Jeon Y.S., Kang B.A., An J.H., and Kim B.H. J. Ceram. Proc. Res. 5 4 (2004) 313-315
2. Kim B.H., An J.H., Jeon Y.S., Jeong J.T., Kang B.A., and Hwang K.S. J. Mater. Sci. 40 1 (2005) 237-239
3. Bian J., Li X., Chen L., and Yao Q. Appl. Phys. Lett. 84 19 (2004) 3783-3785
4. Webb J.B., Williams D.F., and Buchanan M. Appl. Phys. Lett. 39 8 (1981) 640-642
5. Chen Y.F., Bagnall D.M., Hoh H.J., Park K.T., Hiraga K., Zhu Z., and Yao T. J. Appl. Phys. 84 7 (1998) 3912-3918
6. Zhao B., Yang H., Du G., Fang X., Liu D., Gao C., Liu X., and Xie B. Semicond. Sci. Technol. 19 6 (2004) 770-773
7. Kim I.S., Jeong S.H., Kim S.S., and Lee B.T. Semicond. Sci. Technol. 19 3 (2004) L29-L31
8. Tampo H., Yamada A., Fons P., Shibata H., Matsubara K., Iwata K., Niki S., Nakahara K., and Takasu H. Appl. Phys. Lett. 84 22 (2004) 4412-4414
9. Kim K.K., Song J.H., Jung H.J., Park S.J., Song J.H., and Lee J.Y. J. Vac. Sci. Technol. A 18 6 (2000) 2864-2868
10. Park W.I., An S.J., Yi G.C., and Jang H.M. J. Mater. Res. 16 5 (2001) 1358-1362
11. Wang L., Pu Y., Fang W., Dai J., Zheng C., Mo C., Xiong C., and Jiang F. Thin Solid Films 491 1-2 (2005) 323-337
12. Natsume Y., and Sakata H. Thin Solid Films 372 1-2 (2000) 30-36
13. Ayouchi R., Leinen D., Martin F., Gabas M., Dalchiele E., and Ramos-Barrado J.R. Thin Solid Films 426 1-2 (2003) 68-77
14. Nunes P., Fortunato E., and Martins R. Thin Solid Films 383 1-2 (2001) 277-280
15. Paraguay F., Morales J., Estrada W., Andrade E., and Miki-Yoshida M. Thin Solid Films 366 1-2 (2000) 16-27
16. Wang Z., Zhang H., Wang Z., Zhang L., Yuan J., Yan S., and Wang C. J. Mater. Res. 18 1 (2003) 151-155
17. Shimono D., Tanaka S., Torikai T., Watari T., and Murano M. J. Ceram. Proc. Res. 2 4 (2001) 184-188
18. Park W.I., and Yi G.C. J. Electron. Mater. 30 10 (2001) L32-L35
19. Ortíz A., Falcony C., Hernández J.A., Garcia M., and Alonso J.C. Thin Solid Films 293 (1997) 103-107
20. Blasé G. Mater. Chem. Phys. 16 (1987) 201-236
21. Look D.C., Reynolds D.C., Sizelove J.R., Jones R.L., Litton C.W., Cantwell G., and Harsch W.C. Solid State Commun. 105 6 (1998) 399-401