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Thin Solid Films

Volumn 325, Issue 1-2, 1998, Pages 92-98

Surface roughness of oxidised copper films studied by atomic force microscopy and spectroscopic light scattering

(4) Ronnow D a Lindstrom T b Isidorsson, J b Ribbing, C G b

a MAX PLANCK INSTITUT FÜR FESTKÖRPERFORSCHUNG (Germany)

b UPPSALA UNIVERSITY (Sweden)

Author keywords

Atomic force microscopy; Oxidation; Reflection spectroscopy; Surface roughness

Indexed keywords

ATOMIC FORCE MICROSCOPY; COPPER OXIDES; INTERFACES (MATERIALS); LIGHT SCATTERING; PERTURBATION TECHNIQUES; SURFACE ROUGHNESS; THERMOOXIDATION;

SPECTROSCOPIC ELASTIC LIGHT SCATTERING;

METALLIC FILMS;

EID: 0032119690 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(98)00503-3 Document Type: Article

Times cited : (6)

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