Effect of process parameters on electrical, optical properties of IZO films produced by inclination opposite target type DC magnetron sputtering

Transactions of Nonferrous Metals Society of China (English Edition)

Volumn 19, Issue 4, 2009, Pages 997-1000

  SHIN, Do Hoon ^a   KIM, Yun Hae ^b   HAN, Joong Won ^b   MOON, Kyung Man ^b   MURAKAMI, Ri Ichi ^c  

^a Korean Air   (South Korea)

^b Korea Maritime University   (South Korea)

^c UNIVERSITY OF TOKUSHIMA   (Japan)

Author keywords

electromagnetic wave shielding effectiveness(SE); inclination opposite target type DC magnetron sputtering; indium zinc oxide(IZO); transparent conductive oxide(TCO)

Indexed keywords

AMORPHOUS STRUCTURES; DC MAGNETRON SPUTTERING; FILMS PROPERTIES; INCLINATION OPPOSITE TARGET TYPE DC MAGNETRON SPUTTERING; INDIUM-ZINC-OXIDE(IZO); LOWER PRESSURES; PACKING DENSITY; PET SUBSTRATE; PROCESS PARAMETERS; ROOM TEMPERATURE; SINTERED OXIDE; SPUTTERING PRESSURES; TARGET TYPE; TRANSPARENT CONDUCTIVE OXIDE(TCO); ZNO;

ELECTRIC PROPERTIES; ELECTROMAGNETIC SHIELDING; ELECTROMAGNETIC WAVE DIFFRACTION; ELECTROMAGNETIC WAVE SCATTERING; ELECTROMAGNETIC WAVES; FILM THICKNESS; INDIUM; MAGNETIC FILMS; MAGNETIC SHIELDING; MAGNETRON SPUTTERING; MAGNETRONS; MOLECULAR BEAM EPITAXY; OPTICAL PROPERTIES; OXIDE FILMS; RADIATION PROTECTION; SPONTANEOUS EMISSION; TARGETS; ZINC; ZINC OXIDE;

AMORPHOUS FILMS;

EID: 68549130598     PISSN: 10036326     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1003-6326(08)60394-5     Document Type: Article

References (13)

1. KIM V.M., KU D.Y., LEE I.K., SEO Y.W., CHEONG B.K., LEE T.S., KIM I.J., and LEE K.S. The electromagnetic interference shielding effect of indium-zinc oxide/silver alloy multilayered thin films [J]. Thin Solid Films 473 (2004) 315-320
2. 3-ZnO films by radio frequency magnetron sputtering [J]. J Vac Sci Technol A14 (1996) 1704-1708
3. WU W.F., and CHIOU B.S. Properties of radio-frequency magnetron sputtered ITO films without in-situ substrate heating and post-deposition annealing [J]. Thin Solid Films 247 (1994) 201-207
4. KIM H., HORWITZ J.S., KUSHTO G.P., KAFAFI Z.H., and CHRISEY D.B. Indium tin oxide thin films grown on flexible plastic substrates by pulsed-laser deposition for organic light-emitting diodes [J]. Applied Physics Letters 79 (2001) 284-290
5. FAHLAND M., KARLSSON P., and CHARTON C. Low resisitivity transparent electrodes for displays on polymer substrates [J]. Thin Solid Films 392 (2001) 334-337
6. SHIN J.H., SHIN S.H., and PARK J.I. Properties of DC magnetron sputtered indium tin oxide films on polymeric substrates at room temperature [J]. J Appl Phys 89 (2001) 5199-5203
7. de CARVALHO C.N., LAVAREDA G., FORTUNATO E., and AMARAL A. Properties of ITO films deposited by r.f.-PERTE on unheated polymer substrates-Dependence on oxygen partial pressure [J]. Thin Solid Films 427 (2003) 215-218
8. 3-ZnO films deposited on polyethylene terephthalate substrates by radio frequency magnetron sputtering [J]. Jpn J Appl Phys 42 (2003) 223-227
9. SONG P.K., SHIGESATO Y., KAMEI M., and YASUI I. Electrical and structural properties of tin-doped indium oxide films deposited by dc sputtering at room temperature [J]. Jpn J Appl Phys 38 (1999) 2921-2927
10. MENG L.J., and DOS SANTOS M.P. Properties of indium tin oxide (ITO) films prepared by r.f. reactive magnetron sputtering at different pressures [J]. Thin Solid Films 303 (1997) 151-155
11. 3 films: Basic optical properties and applications to energy-efficient windows [J]. J Appl Phys 60 (1986) R123-R160
12. 3: Sn film growth [J]. Thin Solid Films 466 (2004) 250-258
13. KIM H., HORWITZ J.S., KUSHTO G., PIQUE A., KAFAFI Z.H., and GILMORE C.M. Effect of film thickness on the properties of indium tin oxide thin films [J]. J Appl Phys 88 (2000) 6021-6025