Structural and electrical properties of Al doped ZnO thin films deposited at room temperature on poly(vinilidene fluoride) substrates

Thin Solid Films

Volumn 517, Issue 23, 2009, Pages 6290-6293

  Oliveira, C ^a   Rebouta, L ^a   de Lacerda Aroso T ^a   Lanceros Mendez, S ^a   Viseu, T ^a   Tavares, C J ^a   Tovar, J ^a   Ferdov, S ^a   Alves, E ^b  

^a UNIVERSITY OF MINHO   (Portugal)

^b INSTITUTO TECNOLÓGICO E NUCLEAR   (Portugal)

Author keywords

AZOY; Electrical properties; Electroactive polymers; Reactive magnetron sputtering

Indexed keywords

AL-DOPED ZNO; ARGON SPUTTERING; AZOY; ELECTRICAL PROPERTIES; ELECTRICAL RESISTIVITY; ELECTROACTIVE POLYMERS; FILM RESISTIVITY; MAIN PARAMETERS; OPTICAL TRANSMITTANCE; POLY(VINYLIDENE FLUORIDE); POLYCRYSTALLINE; PROCESSING CONDITION; PULSED DC MAGNETRON SPUTTERING; REACTIVE MAGNETRON SPUTTERING; ROOM TEMPERATURE; STRUCTURAL AND ELECTRICAL PROPERTIES; ZNO:AL FILMS;

ALUMINUM; ARGON; CONDUCTING POLYMERS; CONDUCTIVE FILMS; ELECTRIC RESISTANCE; GLASS; MAGNETRONS; METALLIC FILMS; ORGANIC POLYMERS; POLYMER FILMS; POLYMERS; SEMICONDUCTING ZINC COMPOUNDS; SUBSTRATES; ZINC OXIDE;

ELECTRIC PROPERTIES;

EID: 68349095247     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.02.069     Document Type: Article

References (14)

1. Hamberg I., and Granqvist C.G. J. Appl. Phys. 60 (1986) R123
2. Huang J.L., Jah Y.T., Yau B.S., Chen Ch.Y., and Lu H.H. Thin Solid Films 370 (2000) 33
3. Exarhos G.J., and Zhou X. Thin Solid Films 515 (2007) 7025
4. Assunção V., Fortunato E., Marques A., Aguas H., Ferreira I., Costa M.E.V., and Martins R. Thin Solid Films 427 (2003) 401
5. Lim D.G., Kim D.H., Kim J.K., Kwon O., Yang K.J., Park K.I., Kim B.S., Lee S.W., Park M.W., and Kwak D.J. Superlattices Microstruct. 39 (2006) 107
6. Fonrodona M., Escarré J., Villar F., Soler D., Asensi J.M., Bertomeu J., and Andreu J. Solar Energy Mater. Solar Cells 89 (2005) 37
7. Kim K.H., Wibowo R.A., and Munir B. Mater. Lett. Polymer 21 (2006) 1391
8. Swanepoel R. J. Phys. E: Sci. Instrum. 16 (1983) 1214
9. F. Ruske, V. Sittinger, W. Werner, B. Szyszka, K.U. van Osten, K. Dietrich, R. Rix, Surf. Coat. Technol. 200 (2005) 236.
10. Hao X.-T., Tan L.-W., Ong K.-S., and Zhu F. J. Cryst. Growth 287 (2006) 44
11. Krumm S. Mat. Sci. Forum 228-231 (1996) 183
12. Agashe C., Kluth O., Hupkes J., Zastrow U., Rech B., and Wuttig M. J. Appl. Phys. 95 (2004) 1911
13. Ellmer K., and Vollweiler G. Thin Solid Films 496 (2006) 104
14. Fortunato E., Gonçalves A., Assunção V., Marques A., Águas H., Pereira L., Ferreira I., and Martins R. Thin Solid Films 442 (2003) 121