Investigation of (110) Sn O2 growth mechanisms on Ti O 2 substrates by plasma-assisted molecular beam epitaxy

Journal of Applied Physics

Volumn 106, Issue 2, 2009, Pages

  Tsai, M Y ^a   White, M E ^a   Speck, J S ^a  

^a University of California   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVE OXYGEN; ADLAYERS; FILM SURFACES; GROWTH MECHANISMS; GROWTH REGIME; IN-SITU; INTENSITY OSCILLATIONS; OXYGEN PRESSURE; OXYGEN-RICH ENVIRONMENT; PLASMA-ASSISTED MOLECULAR BEAM EPITAXY; QUADRUPOLE MASS SPECTROMETRY; RICH CONDITIONS; TIN ATOMS; TIN DROPLETS;

ATOMS; CRYSTAL GROWTH; ELECTRON DIFFRACTION; HOLOGRAPHIC INTERFEROMETRY; IONIZATION OF GASES; MASS SPECTROMETRY; MOLECULAR BEAM EPITAXY; MOLECULAR BEAMS; MOLECULAR DYNAMICS; MOLECULAR OXYGEN; PLASMAS; SEMICONDUCTOR QUANTUM WIRES;

TIN;

EID: 68249159713     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3176932     Document Type: Article

References (21)

1. A. Rosenthal, A. Tarre, A. Gerst, J. Sundqvist, A. Harsta, A. Aidla, J. Aarik, V. Sammelselg, and T. Uustare, Sens. Actuators B 93, 552 (2003). 10.1016/S0925-4005(03)00236-3
2. J. Sundqvist, J. Lub, M. Ottossona, and A. Hrsta, Thin Solid Films 514, 63 (2006). 10.1016/j.tsf.2006.02.031 (Pubitemid 44043131)
3. A. Tarre, A. Rosental, V. Sammelselg, and T. Uustare, Appl. Surf. Sci. 175, 111 (2001). 10.1016/S0169-4332(01)00051-4 (Pubitemid 32427426)
4. T. W. Kim, D. U. Lee, J. H. Lee, D. C. Choo, M. Jung, and Y. S. Yoon, J. Appl. Phys. 90, 175 (2001). 10.1063/1.1372159 (Pubitemid 33667485)
5. J. W. Erickson, T. B. Fryberger, and S. Semancik, J. Vac. Sci. Technol. A 6, 1593 (1988). 10.1116/1.575333
6. H. Kim and A. Pique, Appl. Phys. Lett. 84, 218 (2004). 10.1063/1.1639515
7. S. F. Ahmed, P. K. Ghosh, S. Khan, M. K. Mitra, and K. K. Chattopadhyay, Appl. Phys. A A86, 139 (2007).
8. K. Murakami, K. Nakajima, and S. Kaneko, Thin Solid Films 515, 8632 (2007). 10.1016/j.tsf.2007.03.128 (Pubitemid 47444355)
9. S. Chacko, N. S. Philip, K. G. Gopchandran, P. Koshy, and V. K. Vaidyan, Appl. Surf. Sci. 254, 2179 (2008). 10.1016/j.apsusc.2007.09.027
10. M. Y. Tsai, M. E. White, and J. S. Speck, J. Cryst. Growth 310, 4256 (2008). 10.1016/j.jcrysgro.2008.06.062
11. M. E. White, M. Y. Tsai, F. Wu, and J. S. Speck, J. Vac. Sci. Technol. A 26, 1300 (2008). 10.1116/1.2966423
12. G. Springholz and G. Bauer, Phys. Status Solidi B 244, 2752 (2007). 10.1002/pssb.200675616
13. C. S. Gallinat, G. Koblmuller, J. S. Brown, and J. S. Speck, J. Appl. Phys. 102, 064907 (2007). 10.1063/1.2781319 (Pubitemid 47509002)
14. G. Koblmuller, J. Brown, R. Averbeck, H. Riechert, P. Pongratz, and J. S. Speck, Appl. Phys. Lett. 86, 041908 (2005). 10.1063/1.1853530 (Pubitemid 40232170)
15. G. Koblmüller, R. Averbeck, H. Riechert, and P. Pongratz, Phys. Rev. B 69, 035325 (2004). 10.1103/PhysRevB.69.035325
16. J. S. Brown, G. Koblmuller, F. Wu, R. Averbeck, H. Riechert, and J. S. Speck, J. Appl. Phys. 99, 074902 (2006). 10.1063/1.2181415
17. M. Ramamoorthy, D. Vanderbilt, and R. D. King-Smith, Phys. Rev. B 49, 16721 (1994). 10.1103/PhysRevB.49.16721
18. L. X. Zheng, M. H. Xie, and S. Y. Tong, Phys. Rev. B 61, 4890 (2000). 10.1103/PhysRevB.61.4890
19. M. Batzill and U. Diebold, Prog. Surf. Sci. 79, 47 (2005). 10.1016/j.progsurf.2005.09.002
20. J. A. Marley and T. C. Macavoy, J. Appl. Phys. 32, 2504 (1961). 10.1063/1.1728340
21. E. Zimmermann, S. Konigs, and D. Neuschutz, Z. Phys. Chem. 193, 195 (1996).