Initial growth of SnO2 thin film on the glass substrate deposited by the spray pyrolysis technique

Thin Solid Films

Volumn 515, Issue 24 SPEC. ISS., 2007, Pages 8632-8636

  Murakami, Kenji ^a   Nakajima, Kiyofumi ^b   Kaneko, Shoji ^c  

^a SHIZUOKA UNIVERSITY   (Japan)

^b ROHM CO LTD   (Japan)

^c SPD LABORATORY INC   (Japan)

Author keywords

AFM; Film growth; Nucleation; Preferential orientation; SnO2 thin film; Spray pyrolysis; XPS

Indexed keywords

ATOMIC FORCE MICROSCOPY; FILM GROWTH; NUCLEATION; PYROLYSIS; SEMICONDUCTING TIN COMPOUNDS; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

PREFERENTIAL ORIENTATION;

OXIDE FILMS;

EID: 34548835764     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.03.128     Document Type: Article

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