Growth and characterization of high surface area titanium carbide

Journal of Physical Chemistry C

Volumn 113, Issue 29, 2009, Pages 12742-12752

  Flaherty, David W ^a   Hahn, Nathan T ^a   Ferrer, Domingo ^a   Engstrom, Todd R ^a   Tanaka, Paul L ^a   Mullins, C Buddie ^a  

^a The University of Texas at Austin   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYOGENIC TEMPERATURES; DEPOSITION ANGLE; DEPOSITION CONDITIONS; ETHYLENE PRESSURE; GLANCING ANGLE; HIGH GROWTH TEMPERATURES; HIGH SPECIFIC SURFACE AREA; HIGH SURFACE AREA; HIGH VACUUM; NANO-COLUMNS; NEAR ROOM TEMPERATURE; POLYCRYSTALLINE; POROUS TITANIUM; POST DEPOSITION ANNEALING; REACTION BYPRODUCTS; SUBSTRATE TEMPERATURE; SURFACE AREA; THERMALLY INDUCED; TITANIUM CARBIDE FILMS;

BYPRODUCTS; DEPOSITION; DESORPTION; ETHYLENE; GROWTH (MATERIALS); GROWTH TEMPERATURE; IONIC LIQUIDS; PHYSICAL VAPOR DEPOSITION; SINTERING; SPECIFIC SURFACE AREA; SUBSTRATES; SURFACE CHEMISTRY; SURFACES; SYNTHESIS (CHEMICAL); TEMPERATURE INDICATING CAMERAS; TITANIUM; TITANIUM CARBIDE; VACUUM DEPOSITION; VAPORS;

SURFACE MORPHOLOGY;

EID: 68049123194     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp904236v     Document Type: Article

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