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Volumn 19, Issue 7, 2009, Pages

An electrostatic 3-phase linear stepper motor fabricated by vertical trench isolation technology

Author keywords

[No Author keywords available]

Indexed keywords

ACTUATION VOLTAGES; ELECTRICAL NETWORKS; HIGH ASPECT RATIO; MECHANICAL CONTACT; MICROMOTOR; SINGLE-CRYSTAL SILICON WAFERS; STEP SIZE; STEPPER MOTOR; STEPPING MOTION; TRENCH ISOLATION;

EID: 67849106663     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/19/7/074001     Document Type: Article
Times cited : (13)

References (18)
  • 1
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    • Design considerations for a practical electrostatic micro-motor
    • Trimmer W S N and Gabriel K J 1987 Design considerations for a practical electrostatic micro-motor Sensors Actuators 11 189-206
    • (1987) Sensors Actuators , vol.11 , pp. 189-206
    • Trimmer, W.S.N.1    Gabriel, K.J.2
  • 5
    • 0026170683 scopus 로고
    • Surface micromachined mechanisms and micromotors
    • Mehregany M and Tai Y-C 1991 Surface micromachined mechanisms and micromotors J. Micromech. Microeng. 1 73-85
    • (1991) J. Micromech. Microeng. , vol.1 , pp. 73-85
    • Mehregany, M.1    Tai, Y-C.2
  • 6
    • 0031223044 scopus 로고    scopus 로고
    • Design and fabrication of surface micromachined micromotors with large dimensions
    • Kraus Th, Baltzer M and Obermeier E 1997 Design and fabrication of surface micromachined micromotors with large dimensions J. Micromech. Microeng. 7 196-9
    • (1997) J. Micromech. Microeng. , vol.7 , pp. 196-199
    • Kraus, Th.1    Baltzer, M.2    Obermeier, E.3
  • 13
    • 0038696531 scopus 로고    scopus 로고
    • Versatile trench isolation technology for the fabrication of microactuators
    • Sarajlic E, Berenschot E, Krijnen G and Elwenspoek M 2003 Versatile trench isolation technology for the fabrication of microactuators Microelectron. Eng. 67-68 430-7
    • (2003) Microelectron. Eng. , vol.67-68 , pp. 430-437
    • Sarajlic, E.1    Berenschot, E.2    Krijnen, G.3    Elwenspoek, M.4
  • 14
    • 4544291377 scopus 로고    scopus 로고
    • Advanced plasma processing combined with trench isolation technology for fabrication and fast prototyping of high aspect ratio MEMS in standard silicon wafers
    • Sarajlic E, de Boer M J, Jansen H V, Arnal N, Puech M, Krijnen G and Elwenspoek M 2004 Advanced plasma processing combined with trench isolation technology for fabrication and fast prototyping of high aspect ratio MEMS in standard silicon wafers J. Micromech. Microeng. 14 S70-S75
    • (2004) J. Micromech. Microeng. , vol.14
    • Sarajlic, E.1    De Boer, M.J.2    Jansen, H.V.3    Arnal, N.4    Puech, M.5    Krijnen, G.6    Elwenspoek, M.7
  • 15
    • 33744534034 scopus 로고    scopus 로고
    • Techniques for characterization of in-plane displacement for microactuators
    • Vanapalli S 2004 Techniques for characterization of in-plane displacement for microactuators Master's Thesis Department of Electrical Engineering, University of Twente
    • (2004) Master's Thesis
    • Vanapalli, S.1
  • 17
    • 0036544009 scopus 로고    scopus 로고
    • A novel high aspect ratio technology for MEMS fabrication using standard silicon wafers
    • Bertz A, Küchler M, Knöfler R and Gessner T 2002 A novel high aspect ratio technology for MEMS fabrication using standard silicon wafers Sensors Actuators A 97-8 691-701
    • (2002) Sensors Actuators , vol.97-98 , pp. 691-701
    • Bertz, A.1    Küchler, M.2    Knöfler, R.3    Gessner, T.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.