Fluorinated acid amplifiers for EUV lithography

Journal of the American Chemical Society

Volumn 131, Issue 29, 2009, Pages 9862-9863

  Kruger, Seth ^a   Revuru, Sri ^a   Higgins, Craig ^a   Gibbons, Sarah ^a,b   Freedman, Daniel A ^a,b   Yueh, Wang ^a,c   Younkin, Todd R ^a,c   Brainard, Robert L ^a  

^a STATE UNIVERSITY OF NEW YORK   (United States)

^b STATE UNIVERSITY OF NEW YORK   (United States)

^c INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

13.5 NM; ACID AMPLIFIERS; AUTOCATALYTIC KINETICS; CHEMICAL EQUATIONS; CYCLOHEXYL; DECOMPOSITION RATE; EUV LITHOGRAPHY; FLUORINATED ACIDS; LINE EDGE ROUGHNESS; SULFONIC ACID; TRIFLUOROMETHYL;

ACIDS; CHEMICAL REACTIONS; PHOTORESISTORS; PHOTORESISTS; SURFACE TREATMENT; ULTRAVIOLET DEVICES;

ROUGHNESS MEASUREMENT;

ACETIC ACID DERIVATIVE; BASE; CIS 1 METHYL 2 [4 (TRIFLUOROMETHYL)PHENYLSULFONYLOXY]CYCLOHEXYL ACETATE; PHENYLBUTAZONE; SULFONIC ACID DERIVATIVE; TRI TERT BUTYLPYRIDINE; UNCLASSIFIED DRUG;

ARTICLE; CATALYSIS; CONTROLLED STUDY; DECOMPOSITION; EXTREME ULTRAVIOLET LITHOGRAPHY; FLUORINATION; FLUORINE NUCLEAR MAGNETIC RESONANCE; KINETICS; SENSITIVITY ANALYSIS; SYNTHESIS; ULTRAVIOLET RADIATION;

ACIDS; CATALYSIS; HYDROCARBONS, FLUORINATED; TIME FACTORS; ULTRAVIOLET RAYS;

EID: 67651230133     PISSN: 00027863     EISSN: None     Source Type: Journal    
DOI: 10.1021/ja901448d     Document Type: Article

References (20)

1. Ito, H.; Breyta, G.; Hofer, D.; Sooriyakumaran, R.; Petrillo, K.; Seeger, D. J. Photopolym. Sci. Technol. 1994, 7, 433-47.
2. Shumway, M. D.; Naulleau, P.; Goldberg, K. A.; Bokor, J. J. Vac. Sci. Technol. B 2005, 23, 2844-2847.
3. Gallatin, G. M.; Naulleau, P.; Niakoula, D.; Brainard, R. L.; Hassanein, E.; Matyi, R.; Thackeray, J.; Spear, K.; Dean, K. Proc. SPIE 2008, 6921, 69211E/1-69211E/11.
4. Brainard, R. L.; Trefonas, P.; Lammers, J. H.; Cutler, C. A.; Mackevich, J. F.; Trefonas, A.; Robertson, S. A. Proc. SPIE 2004, 5374 (Pt. 1), 74-85.
5. Ichimura, K. Chem. Record 2002, 2, 46-55.
6. Gerdts, C. J.; Sharoyan, D. E.; Ismagilov, R. F. J. Am. Chem. Soc. 2004, 126, 6327-31.
7. Lee, S.; Arimitsu, K.; Park, S.-W.; Ichimura, K. J. Photopoly. Sci. and Tech. 2000, 13, 215-216.
8. Park, S.-W.; Arimitsu, K.; Ichimura, K. Macromol. Rapid Commun. 2000, 21, 1050-1053.
9. Arimitsu, K.; Kudo, K.; Ichimura, K. J. Am. Chem. Soc. 1998, 120, 37-45.
10. Kudo, K.; Arimitsu, K.; Ohmori. Ito, H.; Ichimura, K. Chem. Mater. 1999, 11, 2119-2125.
11. 19F spectra.
12. Arimitsu, K.; Kudo, K.; Ichimura, K. J. Am. Chem. Soc. 1998, 120, 37-45.
13. - for 45 s.
14. 3H (or its pyridine salt). Estimated error for rate constants with and without base is 2.5% and 5%, respectively.
15. -1, respectively. This result is consistent with the interpretation that the base removes the acid from the reaction mechanism, but the base does not actively participate in the reaction by extracting protons from the AA bodies.
16. Second-order catalyzed reaction kinetics was evaluated by fitting data to: Capellos, C.; Bielski, B. Kinetic Systems: Mathematical Description of Chemical Kinetics in Solution; Wiley-Interscience: New York, 1972.
17. 0.
18. Z-parameters simultaneously evaluate the resolution, LER, and sensitivity of a resist. Wallow, T.; Higgins, C.; Brainard, R.; Petrillo K.; Montgomery W.; Koay C.-S.; Denbeaux G.; Wood O.; Wei Y. Proc. SPIE 2008,6921, 69211F/1-69211F/11.
19. Four non-fluorinated AAs were evaluated in a 193 nm resist. Sensitivity improved in all cases, and in one case resolution improved. (a) Naito, T.; Ohfuji, T.; Endo, M.; Arimitsu, K.; Ichimura, K. J. Photopolym. Sci. Technol. 1999, 12, 509-514.
20. (b) Ohfui, T.; Takahashi, M.; Kuhara, K.; Ogawa, T.; Ohtsuka, H.; Sasago, M.; Ichimura, K. Proc. SPIE 1997, 3049, 76-82.