193nm superlens imaging structure for 20nm lithography node

Optics Express

Volumn 17, Issue 14, 2009, Pages 11309-11314

  Shi, Zhong ^a   Kochergin, Vladimir ^a   Wang, Fei ^b  

^a LUNA INNOVATIONS INC   (United States)

^b MICRON TECHNOLOGY INC   (United States)

Author keywords

(110.4235) Nanolithography; (240.6680) Surface plasmons

Indexed keywords

OPTICAL CONSTANTS; OPTICS;

DEPTH OF FOCUS; EVANESCENT WAVE; IMAGING STRUCTURE; LITHOGRAPHY RESOLUTION; MASK MATERIALS; SLIT STRUCTURES; SURFACE PLASMONS; TRANSMISSIVITY;

LITHOGRAPHY;

EID: 67650603305     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.17.011309     Document Type: Article

References (16)

1. P. J. Silverman, "Extreme ultraviolet lithography: overview and development status," J. Microhm., Microfab. Microsyst. 4, 011006 (2005).
2. M. D. Stewart, S. C. Johnson, S. V. Sreenivasan, D. J. Resnick, and C. G. Willson, "Nanofabrication with step and flash imprint lithography," J. Microhm., Microfab. Microsyst. 4, 011002 (2005).
3. S. R. J. Brueck, "Optical and interferometric lithography - nanotechnology enablers," Proc. of IEEE 93, 1704-1721 (2005).
4. M. M. Alkaisi, R. J. Blaikie, and S. J. Mcnab, "Nanolithography in the evanescent near field," Adv. Mater. 13, 877-887 (2001).
5. V. G. Veselago, "The electrodynamics of substances with simultaneously negative values of ε and μ," Sov. Phys. USP 10, 509-514 (1968).
6. J. B. Pendry, "Negative refraction makes a perfect lens," Phys. Rev. Lett. 85, 3966-3969 (2000).
7. N. Fang, H. Lee, C. Sun, and X. Zhang, "Sub-diffraction-limited optical imaging with a silver superlens," Science 308, 534-537 (2005).
8. H. Lee, Y. Xiong, N. Fang, W. Srituravanich, S. Durant, M. Ambati, C. Sun, and X. Zhang, "Realization of optical superlens imaging below the diffraction limit," New J. Phys. 7, 255 (2005).
9. W. Srituravanich, N. Fang, S. Durant, M. Ambati, C. Sun, and X. Zhang, "Sub-100 nm lithography using ultrashort wavelength of surface plasmons," J. Vac. Sci. Technol. B 22, 3475-3478 (2004).
10. E. D. Palik, Handbook of Optical Constants of Solids (Academic Press, 1985).
11. D. M. Roessler, D. R. Huffman, "Magnesium oxide (MgO)," in Handbook of Optical Constants of Solid II, E. D. Palik, ed. (Academic Press, 1991).
12. C. C. Katsidis and D. I. Siapkas, "General transfer-matrix method for optical multilayer systems with coherent, partially coherent, and incoherent interference," Appl. Opt. 41, 3978-3987 (2002).
13. A. D. Rakic, A. B. Djurisic, J. M. Elazar, and M. L. Majewaki, "Optical properties of met al.lic films for vertical-cavity optoelectronic devices," Appl. Opt. 22, 5271-5283 (1998).
14. S. A. Ramakrishna, "Physics of negative refractive index materials," Rep. Prog. Phys. 68, 449-521 (2005).
15. H. J. Levinson, Principles of lithography, (SPIE Press, 2004).
16. M. A. Meitl, Z. Zhu, V. Kumar, K. J. Lee, X. Feng, Y. Y. Huang, I. Adesida, R. G. Nuzzo, and J. A. Rogers, "Transfer printing by kinetic control of adhesion to an elastomeric stamp," Nat. Mater. 5, 33-38 (2006).