Impact of advanced gate stack engineering on low frequency noise performances of planar bulk CMOS transistors

AIP Conference Proceedings

Volumn 1129, Issue , 2009, Pages 277-280

  Mercha, A ^a   Okawa, H ^a   Akheyar, A ^a   Simoen, E ^a   Nakabayashi, T ^a   Hoffmann, T Y ^a  

^a CMOS Device Research Group   (Belgium)

Author keywords

CMOS; High k dielectrics; Metal gate; ow frequency noise

Indexed keywords

EID: 67650556997     PISSN: 0094243X     EISSN: 15517616     Source Type: Conference Proceeding    
DOI: 10.1063/1.3140450     Document Type: Conference Paper

References (12)

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