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Volumn 311, Issue 15, 2009, Pages 3911-3917

The growth of GaAs and InAs dots on etched mesas: The effect of substrate temperature on mesa profile and surface morphology on dot distribution

Author keywords

A1. Adatom migration; A1. Low dimensional structure; A1. Surface process; A3. Molecular beam epitaxy

Indexed keywords

A1. ADATOM MIGRATION; A1. LOW-DIMENSIONAL STRUCTURE; A1. SURFACE PROCESS; A3. MOLECULAR BEAM EPITAXY; DOT DENSITY; GAAS; GAAS SUBSTRATES; INAS; INAS QUANTUM DOTS; MESA SHAPE; MESA SIDEWALL; MESA STRUCTURE; SEM; STEP HEIGHT; SUBSTRATE TEMPERATURE; SURFACE CURVATURES;

EID: 67650381977     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2009.04.031     Document Type: Article
Times cited : (1)

References (35)
  • 24
    • 67650425090 scopus 로고    scopus 로고
    • note
    • Sample temperature was measured using a diffuse reflectance spectroscopy system from Thermionix. The relationship between GaAs absorption band-edge position (BE) and temperature (T) used can be approximated by (T/°C)=1.58×(BE/nm)-1220 over the temperature range 480-650 °C.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.