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Volumn 45, Issue 4 A, 2006, Pages 2519-2521
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Site-control of InAs quantum dots using Ex-situ electron-beam lithographic patterning of GaAs substrates
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Author keywords
Atomic force microscopy; InAs quantum dots; Molecular beam epitaxy; Nucleatlon site control; Photoluminescence
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
ETCHING;
LUMINESCENCE;
MOLECULAR BEAM EPITAXY;
PHOTOLUMINESCENCE;
SELF ASSEMBLY;
SEMICONDUCTOR QUANTUM DOTS;
SUBSTRATES;
INAS QUANTUM DOTS;
NUCLEATLON SITE CONTROL;
SEMICONDUCTING INDIUM COMPOUNDS;
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EID: 33645654613
PISSN: 00214922
EISSN: 13474065
Source Type: Journal
DOI: 10.1143/JJAP.45.2519 Document Type: Article |
Times cited : (55)
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References (20)
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