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Volumn 45, Issue 4 A, 2006, Pages 2519-2521

Site-control of InAs quantum dots using Ex-situ electron-beam lithographic patterning of GaAs substrates

Author keywords

Atomic force microscopy; InAs quantum dots; Molecular beam epitaxy; Nucleatlon site control; Photoluminescence

Indexed keywords

ATOMIC FORCE MICROSCOPY; ETCHING; LUMINESCENCE; MOLECULAR BEAM EPITAXY; PHOTOLUMINESCENCE; SELF ASSEMBLY; SEMICONDUCTOR QUANTUM DOTS; SUBSTRATES;

EID: 33645654613     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.2519     Document Type: Article
Times cited : (55)

References (20)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.