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Volumn 5, Issue 3, 2009, Pages 147-151

Atomic modeling of the plasma EUV sources

Author keywords

Collisional radiative model; EUV lithography; Laser produced plasma; Opacity; Plasma spectroscopy

Indexed keywords


EID: 67650321544     PISSN: 15741818     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.hedp.2009.04.002     Document Type: Article
Times cited : (12)

References (12)
  • 2
    • 84960259042 scopus 로고    scopus 로고
    • Bakshi V. (Ed), SPIE Press
    • In: Bakshi V. (Ed). EUV Sources for Lithography (2005), SPIE Press
    • (2005) EUV Sources for Lithography


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.