CO2 laser-produced Sn-plasma source for high-volume manufacturing EUV lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6921, Issue , 2008, Pages

  Endo, Akira ^a   Hoshino, Hideo ^a   Suganuma, Takashi ^a   Nowak, Krzysztof ^a   Yanagida, Tatsuya ^a   Yabu, Takayuki ^a   Asayama, Takeshi ^a   Ueno, Yoshifumi ^a   Moriya, Masato ^a   Nakano, Masaki ^a   Someya, Hiroshi ^a   Nishisaka, Toshihiro ^a   Abe, Tamotsu ^a   Soumagne, Georg ^a   Komori, Hiroshi ^a   Mizoguchi, Hakaru ^a   Sumitani, Akira ^a   Toyoda, Koichi ^a  

^a Extreme Ultra Violet Lithography System Development Association   (Japan)

Author keywords

CO2 laser; EUV light source; Laser produced plasma

Indexed keywords

EUV LIGHT SOURCES; GOOD BEAM QUALITY; HIGH REPETITION RATE; HIGH VOLUME MANUFACTURING; HIGH-POWER; IN-BAND; LASER OUTPUT POWER; LASER POWER; LASER SYSTEMS; MAGNETIC IONS; MASTER OSCILLATOR POWER AMPLIFIERS; SINGLE LASERS; VACUUM CHAMBERS;

EXTREME ULTRAVIOLET LITHOGRAPHY; IONS; LASER BEAMS; LASER PRODUCED PLASMAS; LIGHT SOURCES; MAGNETIC FLUX; MAGNETOPLASMA; MANUFACTURE; OPTICAL PHASE CONJUGATION; POWER AMPLIFIERS; SOLID STATE LASERS; TIN; TIN PLATE;

CARBON DIOXIDE;

EID: 70350630231     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.771959     Document Type: Conference Paper

References (8)

1. Rob Hartman, Closing address presentation at 2006 International EUVL Symposium, October 2006, Barcelona, Spain.
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8. Akira Endo, Hideo Hoshino, Takashi Suganuma, Masato Moriya, Tatsuya Ariga, Yoshifumi Ueno, Masaki Nakano, Takeshi Asayama, Tamotsu Abe, Hiroshi Komori, Georg Soumagne, Hakaru Mizoguchi, Akira Sumitani and Koichi Toyoda, "Laser Produced EUV Light Source Development for HVM, " Proc. SPIE 6517, 65170O (2007).