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Journal of Hazardous Materials

Volumn 168, Issue 2-3, 2009, Pages 765-769

Abatement of perfluorocompounds with microwave plasma in atmospheric pressure environment

(3) Xie, Hongduan a Sun, Bing a Zhu, Xiaomei a

a DALIAN MARITIME UNIVERSITY (China)

Author keywords

Emission spectrum; Microwave plasma; Perfluorocomounds; Removal efficiency

Indexed keywords

ARGON PLASMAS; ATMOSPHERIC LIFETIME; DESTRUCTION AND REMOVAL EFFICIENCY; EMISSION SPECTRUM; GAS FLOWRATE; INITIAL CONCENTRATION; MICROWAVE PLASMA; MICROWAVE POWER; OH RADICAL; OPERATING CONDITION; OPTIMUM CONDITIONS; PERFLUOROCOMOUNDS; PERFLUOROCOMPOUNDS; PLASMA EMISSION SPECTRUM; REMOVAL EFFICIENCY; SEMICONDUCTOR INDUSTRY;

ARGON; ATMOSPHERIC MOVEMENTS; ATMOSPHERIC PRESSURE; FREE RADICALS; GAS ABSORPTION; GASES; GLOBAL WARMING; INDUCTIVELY COUPLED PLASMA; INFRARED RADIATION; MICROWAVES; REMOVAL; SEMICONDUCTOR DEVICE MANUFACTURE; SPECTRUM ANALYZERS;

EMISSION SPECTROSCOPY;

PERFLUORO COMPOUND;

ABSORPTION; ATMOSPHERIC PRESSURE; DECOMPOSITION; EFFICIENCY MEASUREMENT; ELECTRON; EXPERIMENTAL STUDY; FLUOROCARBON; GLOBAL WARMING; HYDROXYL RADICAL; PLASMA; VISIBLE SPECTRUM;

ARTICLE; ATMOSPHERIC PRESSURE; CONCENTRATION RESPONSE; DECOMPOSITION; ELECTRON; FLOW RATE; GAS FLOW; MICROWAVE RADIATION; RADIATION ABSORPTION; SPECTROSCOPY;

ATMOSPHERIC PRESSURE; FLUOROCARBONS; MICROWAVES; OXYGEN; SEMICONDUCTORS;

EID: 67649760689 PISSN: 03043894 EISSN: None Source Type: Journal
DOI: 10.1016/j.jhazmat.2009.02.081 Document Type: Article

Times cited : (19)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.