CF4 decomposition using inductively coupled plasma: Effect of power frequency

IEEE Transactions on Industry Applications

Volumn 41, Issue 1, 2005, Pages 215-220

  Kuroki, Tomoyuki ^a   Mine, Junko ^a,b   Okubo, Masaaki ^a   Yamamoto, Toshiaki ^a   Saeki, Noboru ^c  

^a Osaka Prefecture University   (Japan)

^b EBARA CORPORATION   (Japan)

^c Pearl Kogyo Co Ltd   (Japan)

Author keywords

CF4; Decomposition; Inductively coupled plasma (ICP); Perfluorocompounds (PFCs); Power frequency

Indexed keywords

CARBON DIOXIDE; CARBON MONOXIDE; CHEMICAL VAPOR DEPOSITION; DECOMPOSITION; ELECTRIC POWER SUPPLIES TO APPARATUS; FOURIER TRANSFORM INFRARED SPECTROSCOPY;

PERFLUOROCOMPOUNDS (PFCS); POWER FREQUENCY;

INDUCTIVELY COUPLED PLASMA;

EID: 13844315282     PISSN: 00939994     EISSN: None     Source Type: Journal    
DOI: 10.1109/TIA.2004.840948     Document Type: Article

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