Growth of carbon nanofiber coatings on nickel thin films on fused silica by catalytic thermal chemical vapor deposition: On the use of titanium, titanium-tungsten and tantalum as adhesion layers

Surface and Coatings Technology

Volumn 203, Issue 22, 2009, Pages 3435-3441

  Thakur, D B ^a   Tiggelaar, R M ^a   Gardeniers, J G E ^a   Lefferts, L ^a   Seshan, K ^a  

^a UNIVERSITY OF TWENTE   (Netherlands)

Author keywords

Adhesion layer; Carbon nanofiber; Catalyst support; Catalytic thermal chemical vapor deposition (C TCVD); Fused silica; Nickel catalyst

Indexed keywords

ADHESION LAYER; CATALYTIC THERMAL CHEMICAL VAPOR DEPOSITION (C-TCVD); COATING CHARACTERISTICS; CRYSTALLINE PLATELETS; CRYSTALLINITY; FIBER DIAMETERS; FUSED SILICA SUBSTRATES; GROWTH MODES; LAYER THICKNESS; METALLIC THIN FILMS; MICRO-FLUIDIC DEVICES; MORPHOLOGICAL PROPERTIES; NICKEL CATALYST; NICKEL FILM; NICKEL THIN FILM; NITROGEN ADSORPTION-DESORPTION; SYNTHESIZED CARBON; THERMAL CHEMICAL VAPOR DEPOSITION;

ADHESION; CARBON FIBERS; CARBON FILMS; CARBON NANOFIBERS; CARBON NANOTUBES; CATALYSIS; CATALYST SUPPORTS; CHEMICAL VAPOR DEPOSITION; COATINGS; DESORPTION; ETHYLENE; FILM GROWTH; FILM THICKNESS; GAS ADSORPTION; INTELLIGENT MATERIALS; NICKEL; NICKEL ALLOYS; OXIDES; SCANNING ELECTRON MICROSCOPY; SILICA; SPECIFIC SURFACE AREA; TANTALUM; THICK FILM DEVICES; THIN FILM DEVICES; THIN FILMS; TITANIUM; TRANSMISSION ELECTRON MICROSCOPY; TUNGSTEN; VAPORS;

FUSED SILICA;

EID: 67649389371     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2009.05.011     Document Type: Article

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