Thin-film poly crystalline Si solar cells on foreign substrates: Film formation at intermediate temperatures (700-1300°C)

Applied Physics A: Materials Science and Processing

Volumn 79, Issue 3, 2004, Pages 469-480

  Beaucarne, G ^a   Bourdais, S ^b   Slaoui, A ^b   Poortmans, J ^a  

^a IMEC   (Belgium)

^b CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; CHEMICAL VAPOR DEPOSITION; CRYSTALLIZATION; GRAIN BOUNDARIES; METALLURGY; POLYSILICON; THERMAL EXPANSION; THERMODYNAMIC STABILITY; THIN FILMS;

FOREIGN SUBSTRATES; GRAIN BOUNDARY DENSITY; SURFACE PREPARATION TECHNIQUES;

SOLAR CELLS;

EID: 3042804987     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00339-004-2739-2     Document Type: Review

References (92)

1. J.H. Werner, R.B. Bergmann, R. Brendel: Solid State Phys. 34, 115 (1994)
2. R.B. Bergmann: Appl. Phys. A 69, 187 (1999)
3. J.F. Nijs, J. Szlufcik, J. Poortmans, S. Sivothaman, R.P. Mertens: IEEE Trans. Electron Devices 46, 1948 (1999)
4. K.R. Catchpole, M.J. Me Cann: "A review of thin film silicon for solar cell applications", Proceedings 16th European Photovoltaic Solar Energy Conference (2000) pp. 1165-1168
5. K.R. Catchpole, M.J. Me Cann, K.J. Weber, A.W. Blakers: Solar Energy Mater. Solar Cells 68, 173 (2001)
6. R. Brendel: Thin-film crystalline silicon solar cells - Physics and technology, Chapt. 4 (Wiley-VCH 2003)
7. C. Hebling, A. Eyer, F.R. Faller, A. Hurrle, R. Lüdemann, S. Reber, W. Wettling: Solid State Phys. 38, 663 (1998)
8. S. Reber, W. Wettling: Appl. Phys. A 69, 215 (1999)
9. R.B. Bergmann, J. Köhler, R. Dassow, C. Zaczek, H.J. Werner: Phys. Stat. Sol. (a) 166, 587 (1998)
10. A.K. Ghosh, C. Fishman, T. Feng: J. Appl. Phys. 51.446 (1980)
11. T.L. Chu: "Fabrication of polycrystalline solar cells on low-cost substrates", USP no3961997 (1976)
12. T.L. Chu: "Development of low cost thin film polycrystalline silicon solar cells for terrestrial applications", NSF report NSF/RANN/SE/AER/73- 07843/PR/76/4 (1977)
13. C. Feldman, C.H. Arrington, N.A. Blum, F.G. Satkiewicz: "Vacuum-deposited polycrystalline silicon films for solar-cell applications": SERI Subcontract report SERI/XS9/82781-4 (1980)
14. C. Feldman, N.A. Blum, F.G. Satkiewicz: "Vacuum deposited polycrystalline silicon solar cells for terrestrial use", Proceedings 14th IEEE PVSC (1980) p. 391
15. R. Monna, D. Angermeier, A. Slaoui, J.C. Muller, G. Beaucarne, J. Poortmans, C. Hebung: "Poly-Si films on graphite substrates by rapid thermal chemical vapor deposition for photovoltaic application", Proceedings of the 14th EPVSEC (1997) p. 1456
16. T. Reindl, W. Krühler, M. Pauli, J. Müller: "Electrical and structural properties of the Si/C interface in poly-Si thin films on graphite substrates", Proceedings First WCPEC (1994) pp. 1406-1409
17. G. Beaucarne, S. Bourdais, A. Slaoui, J. Poortmans: Solar Energy Mater. Solar Cells 61, 301 (2000)
18. M. Tazawa, K. Yoshimura, K. Igarashi, S. Tanemura: Solar Energy Materials and Solar Cells 48, 315 (1997)
19. S. Bourdais, F. Mazel, G. Fantozzi, A. Slaoui: Prog. Photovolt: Res. Appl. 7, 437 (1999)
20. S. Reber, G. Stollwerck, D. Osswald, T. Kieliba, C. Kässler: "Crystalline silicon thin-film solar cells on silicon nitride ceramics", Proceedings 16th EPVSEC (2000) pp. 1136-1139
21. A. von Keitz, J.A.M. van Roosmalen, C.J.J. Tool, S.E.A. Schiermeier, A J.M.M. van Zutphen, F. Fung, G.M. Christie: "Improvement of low cost ceramic substrates for use in thin film silicon solar cells", Proceedings 2nd WCPVSEC (1998) pp. 1829-1832
22. British patent application No. GB9603028.3 filing date 14.02.96, publication No. GB2310314 dated 20.08.1997
23. R.B. Bergmann, R. Brendel, M. Wolf, P. Lölgen, J. Krinke, H.P. Strunk, J. Werner: Semicond. Sci. Technol. 12, 224 (1997)
24. N.I. Nemchuk, J.G. Couillard, D.G. Ast, F.P. Fehlner, L.R. Pinckney: "Novel Glass-ceramic substrates for thin film polycrystalline silicon solar cells", Proceedings of the 9th Workshop on crystalline silicon solar cell materials and processes (1999) pp. 90-93
25. T.H. Wang, T.F. Ciszek, M. Page, Y. Yan, R. Bauer, Q. Wang, J. Casey, R. Reedy, R. Matson, R. Ahrenkiel, M.M. Al-Jassim: "Material properties of poly silicon layers deposited by atmospheric pressure iodine vapor transport", Proceedings 28th IEEE PVSC (2000) pp. 138-141
26. A. Gutjahr, C. Grasso, S.E.A. Schiermeier, P.P. Fung, A. von Keitz: "Crystalline silicon growth on silicon nitride and oxynitride substrates for thin film solar cells", Proceedings 16th EPVSEC (2000) pp. 1557-1560
27. Z. Shi: "Solution growth of polycrystalline silicon thin films on glass substrates for low-cost photovoltaic cell application", PhD thesis UNSW, Australia (1992)
28. S. Bourdais, R. Monna, D. Angermeier, A. Slaoui, N. Rauf, A. Laugier, F. Mazel, Y. Jorand, G. Fantozzi: "Combination of RT-CVD and LPE for thin silicon-film formation on alumina substrates", Proceedings 2nd WCPVSEC (1998), pp. 1774-1777
29. S.E.A. Schiermeier, C.J.J. Tool, J.A.M. van Roosmalen, L.J. Laas, A. von Keitz, W. C. Sinke: "LPE-growth of crystalline silicon layers on ceramic substrates", Proceedings 2nd WCPVSEC (1998) pp. 1673-1676
30. A. Gutjahr, I. Silier, G. Cristiani, M. Konuma, F. Banhart, V. Schöllkopf, H. Frey: "Silicon solar cell structure grown by liquid phase epitaxy on glassy carbon", Proceedings of the 14th EPVSEC (1997) pp. 1460-1462
31. J. Kühnle, R.B. Bergmann, J. Krinke, J.H. Werner: Mater. Res. Soc. Symp. Proc. 426, 111 (1996)
32. Y. Bai, D.H. Ford, J.A. Rand, R.B. Hall, A.M. Barnett: "16.6% efficient Silicon-Film polycrystalline silicon solar cells", Proceeding 26th IEEE PVSC (1997) p. 35
33. S. Ito, Y. Kitagawa, T. Mishima, T. Yokoyama: "Direct-grown polycrystalline Si film on carbon substrate by LPE", Technical digest 11th Int. PVSEC (1999) pp. 539-540
34. G. Beaucarne, J. Poortmans, M. Caymax, J. Nijs, R. Mertens: "Tailored Si-layers on silicon oxide obtained by thermal CVD", Proceedings Material Research Symposium "Thin-Film Structures for Photovoltaics" Vol. 485 (1998), pp. 89-94
35. Y. Ishikawa, Y. Yamamoto, T. Hatayama, Y. Uraoka, T. Fuyuki: "Crystallographic analysis of high quality poly-Si thin films deposited by atmospheric pressure chemical vapor deposition", Technical digest 12th PVSEC (2001) pp. 437-438
36. R. Monna, D. Angermeier, A. Slaoui, J.C. Muller, G. Beaucarne, J. Poortmans, C. Hebling: "Poly-Si films on graphite substrates by rapid thermal chemical vapor deposition for photovoltaic application", Proceedings of the 14th EPVSEC (1997) pp. 1456-1459
37. G. Beaucarne, J. Poortmans, M. Caymax, J. Nijs, R. Mertens, D. Angermeier, S. Bourdais, R. Monna, A. Slaoui: "CVD-growth of crystalline Si on amorphous or microcrystalline substrates", Proceedings of the 14th European Photovoltaic Solar Energy Conference (1997) pp. 1007-1010
38. A. Slaoui, R. Monna, D. Angermeir, S. Bourdais, J.C. Muller: "Polycrystalline silicon films formation on foreign substrates by a rapid thermal-CVD technique", Proceedings 26th IEEE-PVSEC (1997) pp. 627-630
39. C. Schmidt, B.v. Ehrenwall, A. Braun, A. Püschel, S. Ruckmich, B. Tierock, M. Nell, H.-G. Wagemann: "Silicon deposition on structered ceramic substrates for thin film solar cells", Proceedings 14th EPVSEC (1997) pp. 2694-2697
40. 3", Technical digest 11th Int. PVSEC-11(1999)pp.749-750
41. A.J.M.M. van Zutphen, A. von Keitz, M. Zeman, J.W. Metselaar: "Film-silicon deposition followed by phosphorus diffusion for photovoltaic application", Proceedings 2nd WCPVSEC (1998)
42. A.J.M.M. van Zutphen, M. Zeman, J.W. Metselaar, A. von Keitz, C.J.J. Tool, G. Beaucarne, J. Poortmans: "Film silicon on ceramic substrates for solar cells", Proceedings 16th EPVSEC (2000) pp. 1412-1415
43. R.S. Wagner, W.C. Ellis: Appl. Phys. Lett. 4, 89 (1964)
44. D. Meakin, J. Stoemenos, P. Migliorato, N.A. Economou: J. Appl. Phys. 61, 5031 (1987)
45. J.H. Werner, K. Taretto, U. Rau: Solid State Phenomena 80-81, 209 (2001)
46. S. Bourdais, G. Beaucarne, J. Poortmans, A. Slaoui: Physica B 273-274, 544 (1999)
47. G. Beaucarne, J. Poortmans, M. Caymax, J. Nijs, S. Bourdais, D. Angermeier, R. Monna, A. Slaoui: "Recrystallization-free thin-film crystalline silicon solar cells on foreign substrates", Proceedings 2nd WCPVSEC (1998) pp.1814-1817
48. T.I. Kamins: "Polycrystalline silicon for integrated circuit applications", Norwell, MA: Kluwer (1988)
49. D.A. Smith, T.Y. Tan: Mater. Res. Soc. Symp. Proc. 5, 65 (1982)
50. R.E. Proano, D.G. Ast: J. Appl. Phys. 66, 2189 (1989)
51. B.L. Sopori, J. Alleman, W. Chen, T.Y. Tan, N.M. Ravindra: Mater. Res. Soc. Symp. Proc. 470, 419 (1997)
52. G. Beaucarne: "Crystalline Si solar cells in thin layers deposited on foreign substrates using high-temperature chemical vapour deposition", Ph.D. Thesis K.U. Leuven, 2000
53. S. Bourdais: "Etude du dépôt et des propriétés physiques du silicium polycristallin obtenu par le procédé RTCVD sur substrats de mullite. Application aux cellules photovoltaïques en couches minces", Ph.D. thesis, Université Louis Pasteur de Strasbourg (2000)
54. Y. Ishikawa, Y. Uraoka, T. Fuyuki: "Nucleation control towards the poly-Si thin films with large grain size utilizing intermittent supply of dichlorosilane", to be published in Proceedings 3rd WCPEC (2003)
55. M.M. Mandurah, K.C. Saraswat, T.I. Kamins: "The physical and electrical properties of polycrystalline silicon", Stanford Electronics Lab., Stanford Univ., Tech. Rep. G503-2 (1981)
56. B. v. Ehrenwall, C. Schmidt, A. Braun, M. Nell, H.-G. Wagemann: "Analysis of silicon growth on structured ceramic substrates for photovoltaic application" Proceedings 2nd WCPVSEC (1998), pp. 1370-1373
57. M.W.M. Graef, L.J. Oiling, J. Bloem: J. Appl. Phys. 48, 3937 (1977)
58. E. Rasmanis: Semiconductor Products, issue June 1963 (1963) pp. 30-33
59. E. Rasmanis: "Method of forming single crystal films on a material in fluid form", United States Patent Office, 3 139 361, patented June 30, 1964
60. T. Yamada, T. Nishioka, M. Tachikawa, T. Yamada: "Deposition of polycrystalline silicon with large grain size from Al-Si melt", Technical digest 11th PVSEC (1999) pp. 739-740
61. 2 decomposed in plasma", Proceedings First WCPVSEC (1994) pp. 1383-1386
62. H.S. Reehal, M.J. Thwaites, T.M. Bruton: Phys. Stat. Sol. (a) 154, 623 (1996)
63. T. Matsuyama, T. Baba, T. Takahama, S. Tsuda, S. Nakano: Solar Energy Mater. Solar Cells 34, 285 (1994)
64. D.Y. Kim, J.H. Lee, J.H. Park, J.K. Ko, J. Yi: "High temperature crystallized poly-Si on the Mo substrate for PV cell applications", Proceedings conference 'PV in Europe - From PV Technology to Energy Solutions', Rome (2002) pp. 485-488
65. A. Neugroschel, J.A. Mazer: IEEE Trans. Electron Devices, Vol. ED-29, No. 2, 225 (1982)
66. G. Beaucarne, J. Poortmans, M. Caymax, J. Nijs, R. Mertens: Solid State phenomena Vols. 67-68, 577 (1999)
67. G. Beaucarne, J. Poortmans, M. Caymax, J. Nijs, R. Mertens: IEEE Transactions on Electron Devices 47, 1118 (2000)
68. G. Beaucarne, S. Bourdais, A. Slaoui, J. Poortmans: "Carrier collection in fine-grained p-n junction polysilicon solar cells", Proceedings 28th IEEE photovoltaic specialists conference (2000) pp. 128-133
69. C. Feldman, N.A. Blum, F.G. Satkiewicz: Proceedings 14th IEEE PVSC (1980) p. 391
70. S.C. Choo: Solid-State Electron. 39, 308 (1996)
71. C. Donolato: "Effective diffusion length of multicrystalline solar cells", Semicond. Sci. Technol. 13, 781 (1998)
72. R.B. Bergmann: Recent Res. Devel. Crystal Growth Res. 1, 241 (1999)
73. P.P. Altermatt, G. Heiser: J. Appl. Phys. 91, 4271 (2002)
74. K. Taretto, U. Rau, J.H. Werner: J. Appl Phys. 93, 5447 (2003)
75. T. Matsuyama, N. Terada, T. Baba, T. Sawada, S. Tsuge, K. Wakisaka, S. Tsuda: J. Non-Cryst. Solids 198-200, 940 (1996)
76. K. Yamamoto: IEEE Trans. Electron Devices 46, 2041 (1999)
77. T. Baba, M. Shima, T. Matsuyama, S. Tsuge, K. Wakisaka, S. Tsuda: "9.2% Efficiency thin-film polycrystalline silicon solar cell by a novel Solid Phase Crystallisation Method", Proceedings 13th EPVSEC (1995) pp.1708-1712
78. P.A. Basore: "Large-area deposition for crystalline silicon on glass modules", Proceedings 3rd WCPEC 2003 Osaka, to be published
79. G. Beaucarne, M. Caymax, I. Peytier, J. Poortmans: Solid State phenomena 80-81, 269 (2001)
80. O. Nast, S. Wenham: J. Appl. Phys. 88, 124 (2000)
81. N.-P. Harder, J.A. Xia, S. Oelting, O. Nast, P. Widenborg, A.G. Aberle: "Low-temperature epitaxial thickening of sub-micron poly-Si seeding layers on glass made by aluminium-induced crystallisation", Proceedings 28th IEEE PVSC (2000) pp. 351-354
82. A.G. Aberle, P.I. Widenborg, A. Straub, N.-P. Harder: "Polycrystalline silicon on glass thin-film solar cell research at UNSW using the seed layer concept" to be published in Proceedings 3rd WCPEC (2003)
83. B. Rau, B. Selle, U. Knipper, S. Brehme, I. Sieber, M. Stöger, P. Schattschneider, S. Gall, W. Funs: "Low-temperature epitaxial Si absorber layers grown by electron-cyclotron resonance chemical vapor deposition", to be published in Proceedings 3rd WCPEC (2003)
84. C. Ornaghi, G. Beaucarne, J. Poortmans, J. Nijs, R. Mertens: "Aluminium induced crystallization of amorphous silicon: Influence of materials characteristics on the reaction", presented at E-MRS 2003, to be published in Thin Solid Films
85. E. Pihan, A. Slaoui, A. Focsa, P. Roca i Cabarrocas: "Polycrystalline silicon films on ceramic substrates by aluminium-induced crystallisation process", to be published in Proceedings 3rd WCPEC (2003)
86. A. Rohatgi, V. Yelundur, J. Jeong, A. Ebong, M.D. Rosenblum, J.I. Hanoka: "Fundamental understanding and implementation of Alenhanced PECVD SiNx hydrogenation in silicon ribbons", Technical Digest of 12th Int. PVSEC (2001), pp. 609-612
87. M.A. Green, S.R. Wenham: Appl. Phys. Lett. 65, 2907 (1994)
88. S. Bourdais, A. Slaoui, G. Beaucarne, J. Poortmans, E. Christoffel, A. Zerga: Solid State Phenomena 82-84, 713 (2002)
89. R. Brendel, R.B. Bergmann, B. Fischer, J. Krinke, R. Plieninger, U. Rau, J. Reiss, H.P. Strunk, H. Wanka, J. Werner: "Transport analysis for polycrystalline silicon solar cells on glass substrates", Proceedings 26th IEEE PVSC (1997) pp. 635-638
90. A. Slaoui, S. Bourdais, G. Beaucarne, J. Poortmans, S. Reber: Solar Energy Mater. Solar Cells 71, 245 (2002)
91. A.J.M.M. van Zutphen: Ph.D. thesis T.U. Delft (2001)
92. G. Beaucarne, A. Slaoui, J. Poortmans: Thin Solid Films 403-404, 229 (2002)