Microstructure and mechanical properties of TiAlN/Si3N4 nano-multilayers synthesized by reactive magnetron sputtering

Journal of Alloys and Compounds

Volumn 481, Issue 1-2, 2009, Pages 710-713

  Yue, Jianling ^a   Li, Geyang ^b  

^a SHANGHAI MARITIME UNIVERSITY   (China)

^b SHANGHAI JIAO TONG UNIVERSITY   (China)

Author keywords

Crystal growth; Microstructure; Thin films; Vapour deposition

Indexed keywords

AMORPHOUS SI; COHERENT GROWTH; COHERENT STRAIN; ENERGY DISPERSIVE X RAY SPECTROSCOPY; HARDNESS AND ELASTIC MODULUS; HARDNESS ENHANCEMENT; LAYER THICKNESS; MAXIMUM VALUES; MICROSTRUCTURE AND MECHANICAL PROPERTIES; NANOMULTILAYERS; REACTIVE MAGNETRON SPUTTERING; TEMPLATE EFFECTS; VAPOUR DEPOSITION;

AMORPHOUS SILICON; CRYSTAL GROWTH; CRYSTAL MICROSTRUCTURE; CRYSTALLIZATION; FILM PREPARATION; GRAIN BOUNDARIES; HARDNESS; MAGNETRONS; MECHANICAL PROPERTIES; SCANNING ELECTRON MICROSCOPY; SILICON;

MULTILAYERS;

EID: 67649292794     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2009.03.103     Document Type: Article

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