Nanolithography based on an atom pinhole camera

Nanotechnology

Volumn 20, Issue 23, 2009, Pages

  Melentiev, P N ^a   Zablotskiy, A V ^b   Lapshin, D A ^a   Sheshin, E P ^b   Baturin, A S ^b   Balykin, V I ^a  

^a INSTITUTE OF SPECTROSCOPY   (Russian Federation)

^b MOSCOW INSTITUTE OF PHYSICS AND TECHNOLOGY   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

ATOM OPTICS; EXPERIMENTAL PHYSICS; FOCUSING ELEMENTS; METHOD OF IMAGES; PIN-HOLE CAMERAS; SI SURFACES;

CAMERAS; NANOSTRUCTURES;

ATOMS;

NANOMATERIAL; SILICON;

ARTICLE; ATOM; CAMERA; CHEMICAL STRUCTURE; IMAGE ENHANCEMENT; IMAGING SYSTEM; LENS; MOLECULAR IMAGING; MOLECULAR SIZE; NANOFABRICATION; PRIORITY JOURNAL; STRUCTURE ANALYSIS;

EID: 67649228959     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/20/23/235301     Document Type: Article

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