Inactivation of bacteria by a mixed argon and oxygen micro-plasma as a function of exposure time

International Journal of Radiation Biology

Volumn 85, Issue 4, 2009, Pages 362-368

  Weng, Chih Chiang ^a   Wu, Yi Te ^a   Liao, Juinn Der ^a   Kao, Chi Yuan ^a   Chao, Chih Cheng ^a   Chang, Juu En ^a   Hsu, Bo Wen ^b  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

^b Chi Mei Optoelectronics Corporation   (Taiwan)

Author keywords

Dielectric barrier discharge; Inactivation of bacteria; Micro plasma; Oxygen argon ratio

Indexed keywords

ARGON; DIMETICONE; OXYGEN; BAYSILON; FREE RADICAL;

ARTICLE; BACTERIAL GROWTH; BACTERIAL SURVIVAL; BACTERIAL VIABILITY; BACTERIUM CULTURE; CONTROLLED STUDY; ESCHERICHIA COLI; FLAME PHOTOMETRY; NONHUMAN; PRIORITY JOURNAL; TEMPERATURE SENSITIVITY; ATMOSPHERE; CHEMISTRY; DRUG EFFECT; GROWTH, DEVELOPMENT AND AGING; IMPEDANCE; MICROBIAL VIABILITY; PHYSIOLOGY; TEMPERATURE; TIME;

BACTERIA (MICROORGANISMS); ESCHERICHIA COLI;

ARGON; ATMOSPHERE; DIMETHYLPOLYSILOXANES; ELECTRIC IMPEDANCE; ESCHERICHIA COLI; FREE RADICALS; MICROBIAL VIABILITY; OXYGEN; TEMPERATURE; TIME FACTORS;

EID: 67649171316     PISSN: 09553002     EISSN: 13623095     Source Type: Journal    
DOI: 10.1080/09553000902781105     Document Type: Article

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