메뉴 건너뛰기




Volumn 235, Issue 1-2, 2004, Pages 151-155

Sterilization by oxygen plasma

Author keywords

End point detection; Plasma; Sterilization

Indexed keywords

BIOMATERIALS; CONTAMINATION; EMISSION SPECTROSCOPY; ETCHING; ETHYLENE; GAMMA RAYS; OXIDATION; PLASMAS; POLYMERS; SCANNING ELECTRON MICROSCOPY;

EID: 4344644704     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2004.05.128     Document Type: Conference Paper
Times cited : (56)

References (12)
  • 1
    • 4344622931 scopus 로고
    • Remington's Pharmaceutics Sciences, Mack, Pennsylvania
    • G.B. Philips, Sterilization, 15th ed., Remington's Pharmaceutics Sciences, Mack, Pennsylvania, 1975.
    • (1975) Sterilization, 15th Ed.
    • Philips, G.B.1
  • 2
    • 0028789312 scopus 로고
    • The relative safety of gamma-ray
    • Shintani H. The relative safety of gamma-ray. Biomed. Instrum. Technol. 29:1995;513-519.
    • (1995) Biomed. Instrum. Technol. , vol.29 , pp. 513-519
    • Shintani, H.1
  • 4
    • 0030074574 scopus 로고    scopus 로고
    • Low-temperature sterilization technologies: Do we need to redefine 'sterilization'?
    • Rutala W.A., Weber D.J. Low-temperature sterilization technologies: do we need to redefine 'sterilization'? J. Infect. Control. 17:1996;87-91.
    • (1996) J. Infect. Control , vol.17 , pp. 87-91
    • Rutala, W.A.1    Weber, D.J.2
  • 5
    • 0030159190 scopus 로고    scopus 로고
    • Desinfection and sterilization of patient-care items
    • Rutala W.A. Desinfection and sterilization of patient-care items. J. Infect. Control. 17:1996;377-384.
    • (1996) J. Infect. Control , vol.17 , pp. 377-384
    • Rutala, W.A.1
  • 6
    • 0034108982 scopus 로고    scopus 로고
    • Effect of gas composition on spore mortality and etching during low-pressure plasma sterilization
    • Lerouge S., Wertheimer M.R., Marchand R., Tabriziani M., Yahia L'H. Effect of gas composition on spore mortality and etching during low-pressure plasma sterilization. J. Biomed. Mater. Res. 51:2000;129-135.
    • (2000) J. Biomed. Mater. Res. , vol.51 , pp. 129-135
    • Lerouge, S.1    Wertheimer, M.R.2    Marchand, R.3    Tabriziani, M.4    Yahia, L'H.5
  • 7
    • 0033160447 scopus 로고    scopus 로고
    • Sporicidal activity of a new low-temperature sterilization technology: The sterred 50 sterilizer
    • Rutala W.A., Gergen M.F., Weber D.J. Sporicidal activity of a new low-temperature sterilization technology: the sterred 50 sterilizer. J. Infect. Control. 20:1999;514-516.
    • (1999) J. Infect. Control , vol.20 , pp. 514-516
    • Rutala, W.A.1    Gergen, M.F.2    Weber, D.J.3
  • 8
    • 0031247362 scopus 로고    scopus 로고
    • Physical and chemical modifications of high-voltage pulse sterilization
    • Ohshima T., Sata K., Terauchi H., Sato M. Physical and chemical modifications of high-voltage pulse sterilization. J. Electrostat. 42:1997;159-166.
    • (1997) J. Electrostat. , vol.42 , pp. 159-166
    • Ohshima, T.1    Sata, K.2    Terauchi, H.3    Sato, M.4
  • 9
    • 0031734297 scopus 로고    scopus 로고
    • Coût de fonctionnement de deux systèmes de stérilisation à basse température, centralisé et decentralisé
    • Hermelin I.J., Burtin C., Leverge R., Prugnaud J.L. Coût de fonctionnement de deux systèmes de stérilisation à basse température, centralisé et decentralisé J. Pharm. Clin. 17:1998;138-144.
    • (1998) J. Pharm. Clin. , vol.17 , pp. 138-144
    • Hermelin, I.J.1    Burtin, C.2    Leverge, R.3    Prugnaud, J.L.4
  • 10
    • 0035845749 scopus 로고    scopus 로고
    • Low-temperature sterilization using gas plasmas: A review of the experiments and an analysis of the inactivation mechanisms
    • Moysan M., Barbeau J., Moreau S., Pelletier J., Tabrizian M., Yahia L'H. Low-temperature sterilization using gas plasmas: a review of the experiments and an analysis of the inactivation mechanisms. Int. J. Pharmaceut. 226:2001;1-21.
    • (2001) Int. J. Pharmaceut. , vol.226 , pp. 1-21
    • Moysan, M.1    Barbeau, J.2    Moreau, S.3    Pelletier, J.4    Tabrizian, M.5    Yahia, L'H.6
  • 12
    • 0032520365 scopus 로고    scopus 로고
    • Anisotropic reactive ion etching in silicon, using a graphite electrode
    • Mansano R.D., Verdonck P., Maciel H.S. Anisotropic reactive ion etching in silicon, using a graphite electrode. Sens. Actuators A. 65:1998;180-186.
    • (1998) Sens. Actuators A , vol.65 , pp. 180-186
    • Mansano, R.D.1    Verdonck, P.2    Maciel, H.S.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.