Strontium-doped lanthanum manganite coatings crystallised after air annealing of amorphous co-sputtered films

Materials Chemistry and Physics

Volumn 116, Issue 1, 2009, Pages 219-222

  Capon, F ^a   Horwat, D ^a   Pierson, J F ^a   Chapusot, V ^b   Billard, A ^c  

^a INSTITUT JEAN LAMOUR   (France)

^b PVDco sàrl ^*  (France)

^c UNIVERSITÉ DE TECHNOLOGIE DE BELFORT MONTBÉLIARD   (France)

Author keywords

Crystallisation; Oxides; Sputtering; Thin films

Indexed keywords

AIR-ANNEALING; AS-DEPOSITED FILMS; ATOMIC RATIOS; CO-SPUTTERED FILMS; CRYSTALLISATION; DISCHARGE CURRENTS; ELECTRICAL CONDUCTIVITIES; FILM COMPOSITIONS; PEROVSKITE STRUCTURES; REACTIVE CO-SPUTTERING; ROOM TEMPERATURES; STOICHIOMETRIC COMPOSITIONS; STRONTIUM-DOPED LANTHANUM MANGANITES; YTTRIA STABILISED ZIRCONIAS;

BRITTLE FRACTURE; CRYSTAL ATOMIC STRUCTURE; CRYSTALLIZATION; ELECTRIC CONDUCTIVITY; LANTHANUM; LANTHANUM ALLOYS; LANTHANUM COMPOUNDS; MANGANESE; MANGANESE COMPOUNDS; OXIDE MINERALS; PEROVSKITE; SEMICONDUCTING SILICON COMPOUNDS; SODIUM COMPOUNDS; SPUTTER DEPOSITION; STRONTIUM; TARGETS; THIN FILMS; ZIRCONIA;

AMORPHOUS FILMS;

EID: 67349138801     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2009.03.021     Document Type: Article

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