Recent results on reactive magnetron sputtering for high-rate deposition of ceramic compound films

Materials Science Forum

Volumn 287-288, Issue , 1998, Pages 107-116

  Billard, A ^a   Frantz, C ^a  

^a INSTITUT JEAN LAMOUR   (France)

Author keywords

Arcing; Ceramic Compound Films; Control Techniques; High Rate Deposition; Modulated Discharge; Pulsed Discharge; Reactive Magnetron Sputtering; Sputtering Instability

Indexed keywords

EID: 11544318271     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: None     Document Type: Article

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