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Surface and Coatings Technology

Volumn 97, Issue 1-3, 1997, Pages 574-581

Enhanced deposition rate of d.c. reactively sputtered TiO2 films by means of low-frequency modulation of the discharge current

(4) Lapostolle, F a Loï, Tran Huu a Billard, A a Frantz, C a

a INSTITUT JEAN LAMOUR (France)

Author keywords

Discharge instability; Low frequency modulation; Reactive sputtering; Titanium dioxide

Indexed keywords

ARGON; ELECTRIC DISCHARGES; FILM GROWTH; METALLIC FILMS; NUCLEATION; OXYGEN; TITANIUM DIOXIDE;

DISCHARGE INSTABILITY; LOW FREQUENCY MODULATION; REACTIVE SPUTTERING;

MAGNETRON SPUTTERING;

EID: 0031386713 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/S0257-8972(97)00177-1 Document Type: Article

Times cited : (17)

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