Solid-phase crystallization of amorphous silicon on ZnO:Al for thin-film solar cells

Solar Energy Materials and Solar Cells

Volumn 93, Issue 6-7, 2009, Pages 855-858

  Becker, C ^a   Conrad, E ^a   Dogan, P ^a   Fenske, F ^a   Gorka, B ^a   Hanel T ^a   Lee, K Y ^a   Rau, B ^a   Ruske, F ^a   Weber, T ^a   Berginski, M ^b   Hupkes J ^b   Gall, S ^a   Rech, B ^a  

^a HAHN MEITNER INSTITUT   (Germany)

^b FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

Polycrystalline silicon; Solid phase crystallization; Thin film solar cell; Transparent conductive oxide

Indexed keywords

ABSORBER LAYERS; COATED GLASS; DIRECT DEPOSITIONS; ELECTRICAL AND OPTICAL PROPERTIES; POLY-SI FILMS; POLYCRYSTALLINE SILICON; POLYCRYSTALLINE SILICON (POLYSI); SOLID-PHASE CRYSTALLIZATION; THIN SILICON FILMS; THIN-FILM SOLAR CELL; TRANSPARENT CONDUCTIVE OXIDE; ZNO; ZNO:AL FILMS; ZNO:AL THIN FILMS;

ALUMINUM; AMORPHOUS SILICON; CRYSTALLIZATION; ELECTRIC RESISTANCE; GLASS; HEAT RESISTANCE; METALLIC FILMS; NONMETALS; OPTICAL PROPERTIES; PHOTOVOLTAIC CELLS; POLYCRYSTALLINE MATERIALS; POLYSILICON; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTING ZINC COMPOUNDS; SOLAR CELLS; THIN FILM DEVICES; ZINC OXIDE;

FILM PREPARATION;

EID: 67349112391     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2008.09.059     Document Type: Article

References (13)

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