Single layer and multilayered films of plasma polymers analyzed by nanoindentation and spectroscopic ellipsometry

Thin Solid Films

Volumn 517, Issue 21, 2009, Pages 6034-6037

  Cech, V ^a   Cechalova, B ^a   Trivedi, R ^a   Studynka, J ^a  

^a BRNO UNIVERSITY OF TECHNOLOGY   (Czech Republic)

Author keywords

Atomic force microscopy (AFM); Ellipsometry; Multilayers; Plasma processing and deposition

Indexed keywords

A-SIC:H; ATOMIC FORCE MICROSCOPY (AFM); BEVELED SECTION; ELLIPSOMETRIC DATA; IN-SITU; MULTI-LAYERED; MULTI-LAYERED FILMS; PLASMA POLYMERS; PLASMA PROCESSING AND DEPOSITION; REALISTIC MODEL; SAMPLE STRUCTURE; SINGLE LAYER; SINGLE LAYER FILMS; TETRAVINYLSILANE;

ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; ATOMS; MECHANICAL PROPERTIES; MULTILAYERS; NANOINDENTATION; OPTICAL CONSTANTS; PLASMA DEPOSITION; PLASMA DEVICES; PLASMAS; REFRACTIVE INDEX; SILICON CARBIDE; SPECTROSCOPIC ELLIPSOMETRY; VAPOR DEPOSITION;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 67249124577     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.05.025     Document Type: Article

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