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Volumn 201, Issue 9-11 SPEC. ISS., 2007, Pages 5512-5517
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Physico-chemical properties of plasma-polymerized tetravinylsilane
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Author keywords
B Nano indentation; C PE CVD; Atomic force microscopy (AFM); Ellipsometry; Infrared spectroscopy; Rutherford backscattering spectroscopy
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Indexed keywords
ELASTIC MODULI;
GLOW DISCHARGES;
HARDNESS;
INDENTATION;
INFRARED SPECTROSCOPY;
LASER MODES;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
PLASMA POLYMERIZATION;
REFRACTIVE INDEX;
RUTHERFORD BACKSCATTERING SPECTROSCOPY;
SILICON WAFERS;
SURFACE ROUGHNESS;
DEPOSITION RATE;
TETRAVINYLSILANE;
SILANES;
ELASTIC MODULI;
GLOW DISCHARGES;
HARDNESS;
INDENTATION;
INFRARED SPECTROSCOPY;
LASER MODES;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
PLASMA POLYMERIZATION;
REFRACTIVE INDEX;
RUTHERFORD BACKSCATTERING SPECTROSCOPY;
SILANES;
SILICON WAFERS;
SURFACE ROUGHNESS;
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EID: 33846505375
PISSN: 02578972
EISSN: None
Source Type: Journal
DOI: 10.1016/j.surfcoat.2006.07.086 Document Type: Article |
Times cited : (21)
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References (11)
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