Correlation between mechanical, optical and chemical properties of thin films deposited by PECVD

Surface and Coatings Technology

Volumn 202, Issue 22-23, 2008, Pages 5572-5575

  Cech, V ^a   Studynka, J ^a   Cechalova, B ^a   Mistrik, J ^a,b   Zemek, J ^c  

^a BRNO UNIVERSITY OF TECHNOLOGY   (Czech Republic)

^b UNIVERSITY OF PARDUBICE   (Czech Republic)

^c INSTITUTE OF PHYSICS   (Czech Republic)

Author keywords

Ellipsometry; Fourier transform infrared spectroscopy; PACVD; Photoelectron spectroscopy; Plasma polymerization

Indexed keywords

CHEMICAL PROPERTIES; GRADIENT METHODS; MECHANICAL PROPERTIES; MOLECULAR BEAM EPITAXY; OPTICAL CORRELATION; OPTICAL PROPERTIES; PLASMA DEPOSITION; PLASMAS; REFRACTIVE INDEX; THICK FILMS; THIN FILMS;

DEPOSITION CONDITIONS; ELLIPSOMETRY; FILM SURFACES; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HELICAL COUPLING PLASMA SYSTEM; LAYERED STRUCTURED; OPTICAL-; PACVD; PHOTOELECTRON SPECTROSCOPY; PLASMA POLYMERIZATION; PLASMA-POLYMERIZED FILMS; SAMPLE THICKNESS; VINYLTRIETHOXY SILANE; YOUNG'S MODULUS;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 50349088464     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2008.06.031     Document Type: Article

References (8)

1. Wrobel A.M., and Wertheimer M.R. In: Agostino R.D. (Ed). Plasma Deposition, Treatment, and Etching of Polymers (1990), Academic Press, New York 163
2. Segui Y. In: Agostino R.D., Favia P., and Fracassi F. (Eds). Proc. NATO ASI Plasma Processing of Polymers (1997), Kluwer Academic, Boston 305
3. Cech V., Xu L., Vanek J., and Drzal L.T. Jpn. J. Appl. Phys. 45 (2006) 8440
4. Jellison Jr. G.E., and Modine F.A. Appl. Phys. Lett. 69 (1996) 371
5. Tauc J., Grigorovici R., and Vancu A. Phys. Stat. Solidi 15 (1966) 627
6. Stenzel O., Roth S., and Scharff W. Thin Solid Films 190 (1990) 9
7. J. Mistrik, B. Cechalova, J. Studynka, V. Cech, J. Mater. Sci. (2008) (forthcoming).
8. Philips J.C. In: Landsberg P.T. (Ed). Handbook on Semiconductors vol. 1 (1992), Elsevier, Amsterdam 47