Electron energy-loss spectroscopy study of a multilayered SiOx and SiOxCy film prepared by plasma-enhanced chemical vapor deposition

Journal of Materials Research

Volumn 21, Issue 3, 2006, Pages 608-612

  Zhang, Zaoli ^a   Wagner, Thomas ^a   Sigle, Wilfried ^a   Schulz, Andreas ^b  

^a MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

^b UNIVERSITY OF STUTTGART   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON ENERGY LOSS SPECTROSCOPY; FILM PREPARATION; INTERDIFFUSION (SOLIDS); MULTILAYERS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; SUBSTRATES;

ENERGY-LOSS NEAR-EDGE STRUCTURES; GAS MIXTURES; SCANNING TRANSMISSION ELECTRON MICROSCOPY; SILICON SUBSTRATES;

SILICON COMPOUNDS;

EID: 33645110880     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/jmr.2006.0073     Document Type: Article

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