REBL nanowriter: Reflective electron beam lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7271, Issue , 2009, Pages

  Petric, Paul ^a   Bevis, Chris ^a   Brodie, Alan ^a   Carroll, Allen ^a   Cheung, Anthony ^a   Grella, Luca ^a   McCord, Mark ^a   Percy, Henry ^a   Standiford, Keith ^a   Zywno, Marek ^a  

^a KLA TENCOR CORPORATION   (United States)

Author keywords

Direct write; DPG; Ebeam; Gray level; Lithography; Maskless; Reflective electron optics; Rotary stage; TDI

Indexed keywords

DIRECT WRITE; DPG; EBEAM; GRAY LEVEL; MASKLESS; REFLECTIVE ELECTRON OPTICS; ROTARY STAGE; TDI;

APPLICATION SPECIFIC INTEGRATED CIRCUITS; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; ELECTRON OPTICS; ELECTRONS; INTERCHANGES; NANOTECHNOLOGY;

THROUGHPUT;

EID: 67149147445     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.817319     Document Type: Conference Paper

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