Development status of Canon's full-field EUV tool

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7271, Issue , 2009, Pages

  Hasegawa, Takayuki ^a   Uzawa, Shigeyuki ^a   Honda, Tokuyuki ^a   Higaki, Yoshinari ^a   Miyake, Akira ^a   Morishima, Hideki ^a  

^a CANON INC   (Japan)

Author keywords

Contamination; EUVL; Exposure tool; Illumination optics; Lithography; Projection optics

Indexed keywords

EUVL; EXPOSURE TOOL; FULL-FIELD; HIGH NA; HIGH VOLUME MANUFACTURING; ILLUMINATION OPTICS; OFF-AXIS ILLUMINATION; PROJECTION OPTICS; RESOLUTION CAPABILITY; SIMULATION RESULT; SYSTEM DESIGN;

EXPOSURE METERS; MIRRORS; TECHNOLOGY; ULTRAVIOLET DEVICES;

EXTREME ULTRAVIOLET LITHOGRAPHY;

EID: 67149098342     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.813465     Document Type: Conference Paper

References (6)

1. Ralph Kurt et al., "Radiation-induced carbon contamination of optics", Proc. of SPIE 4688, 702-709, 2002
2. Jeromy T. Hollenshead and Leonard E. Klebanoff, "Modeling carbon contamination of extreme ultraviolet (EUV) optics", Proc. of SPIE 5374, 675-685, 2005
3. J. Hollenshead et al, "Modeling radiation-induced carbon contamination of extreme ultraviolet optics", J. Vac. Sci. Technol. B 24(1), 64-82, 2006 (Pubitemid 43164188)
4. S. Matsunari et al., "Carbon deposition on multi-layer mirrors by extreme ultra violet ray Irradiation", Proc. of SPIE 6517, 2X, 2007
5. S. B. Hill et al., "Accelerated lifetime metrology of EUV multilayer mirrors in hydrocarbon environments", Proc. of SPIE 6921-42 (2008)
6. T. Nakayama et al., "Analysis of carbon deposition on multilayer mirrors by using two different beamlines", SPIE Advanced litho 7271-134 (2009)