Micro four-point probe with high spatial resolution for ion implantation and ultra-shallow junction characterization

AIP Conference Proceedings

Volumn 1066, Issue , 2008, Pages 167-170

  Kjaer, Daniel ^a   Lin, Rong ^a   Petersen, Dirch Hjorth ^a,b   Kopalidis, Petros M ^c   Eddy, Ronald ^d   Walker, David A ^d   Egelhoff, William F ^e   Pickert, Larry ^f  

^a Capres AS   (Denmark)

^b TECHNICAL UNIVERSITY OF DENMARK   (Denmark)

^c ALEXANDER TECHNOLOGICAL EDUCATIONAL INSTITUTE OF THESSALONIKI   (Greece)

^d Innovion Corporation   (United States)

^e NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^f MICROCHIP TECHNOLOGY INC   (United States)

Author keywords

Diagnostics; Four point probe; Ion implantation; Process control; Sheet resistance

Indexed keywords

EID: 66549130399     PISSN: 0094243X     EISSN: 15517616     Source Type: Conference Proceeding    
DOI: 10.1063/1.3033583     Document Type: Conference Paper

References (6)

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3. C. L. Petersen, R. Lin, D. H. Petersen, P. F. Nielsen, Micro-Scale Sheet Resistance Measurements on Ultra-Shallow Junction 14th IEEE Conference on Advanced Thermal Processing of Semiconductors Proceedings, IEEE, Piscataway, NJ, 153, 2006.
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5. P. M. Kopalidis, B. S. Freer, M. Rathmell, Journal of the Electrochemical Society 152, G623, (2005).
6. th International Conference on Ion Implantation Technology Proceedings, E. Ishida, S. Banerjee, S. Mehta, T. C. Smith, M. Current, A. Tasch editors, IEEE, Piscataway, NJ, 268, 1997.