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Volumn , Issue , 2006, Pages 153-158
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Micro-scale sheet resistance measurements on ultra shallow junctions
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Author keywords
[No Author keywords available]
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Indexed keywords
CRYSTALS;
ELECTRIC CONDUCTIVITY;
ELECTRIC RESISTANCE;
ELECTRIC RESISTANCE MEASUREMENT;
INTERNET PROTOCOLS;
LASERS;
PLASMAS;
RAPID THERMAL ANNEALING;
REAL TIME SYSTEMS;
SEMICONDUCTOR JUNCTIONS;
SEMICONDUCTOR LASERS;
SEMICONDUCTOR MATERIALS;
ANNEALED WAFERS;
ANNEALING PROCESSES;
CONTACT FORCES;
IMPLANTED WAFERS;
LASER ANNEAL;
LASER SPOTS;
MICROSCOPIC PROBES;
NEW TECHNIQUES;
ON WAFERS;
ORDERS OF MAGNITUDES;
PATTERNED WAFERS;
POINT MEASUREMENTS;
SHALLOW JUNCTIONS;
SHEET RESISTANCE MEASUREMENTS;
SHEET RESISTANCE VARIATIONS;
SHEET RESISTANCE;
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EID: 48349090689
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1109/RTP.2006.367996 Document Type: Conference Paper |
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Times cited : (17)
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References (9)
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