Accurate sheet resistance measurement on ultra-shallow profiles

Materials Research Society Symposium Proceedings

Volumn 912, Issue , 2006, Pages 197-202

  Clarysse, Trudo ^a   Moussa, Alain ^a   Leys, Frederik ^a   Loo, Roger ^a   Vandervorst, Wilfried ^a,b   Benjamin, Mark C ^c   Hillard, Robert J ^c   Faifer, Vladimir N ^d   Current, Michael I ^d   Lin, Rong ^e   Petersen, Dirch H ^e  

^a MEC   (Belgium)

^b UNIVERSITY OF LEUVEN   (Belgium)

^c Solid State Measurements Inc   (United States)

^d Frontier Semiconductor Inc   (United States)

^e Capres AS   (Denmark)

Author keywords

[No Author keywords available]

Indexed keywords

BORON; CHEMICAL VAPOR DEPOSITION; CMOS INTEGRATED CIRCUITS; DOPING (ADDITIVES); FILM GROWTH; INTEGRATED CIRCUIT MANUFACTURE;

FOUR POINT PROBE MEASUREMENTS; SHEET RESISTANCE TOOLS; ULTRA SHALLOW (USJ) PROFILES;

ELECTRIC RESISTANCE MEASUREMENT;

EID: 33751048422     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-0912-c05-07     Document Type: Conference Paper

References (10)

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