Accurate dose matching measurements between different ion implanters

Proceedings of the International Conference on Ion Implantation Technology

Volumn , Issue , 1996, Pages 268-271

  Falk, Scott ^a   Callahan, Ray ^a   Lundquist, Paul ^a  

^a VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DOSIMETRY; ION BEAMS; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DOPING; STATISTICAL PROCESS CONTROL;

BEAM CURRENT DUTY CYCLE; THERMAL WAVES;

ION IMPLANTATION;

EID: 0030369717     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)