Japan could dominate industry with X-ray lithography

Semiconductor International

Volumn 24, Issue 2, 2001, Pages

  Smith, Henry I ^a,b,c,d,e  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^b USA   (United States)

^c MIT's Nanostructures Laboratory

^d MIT LINCOLN LABORATORY   (United States)

^e NATIONAL ACADEMY OF ENGINEERING   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MOORE'S LAW;

INTEGRATED OPTOELECTRONICS; MASKS; RANDOM ACCESS STORAGE; SEMICONDUCTOR DEVICE MANUFACTURE; SYNCHROTRONS;

X RAY LITHOGRAPHY;

EID: 6644223778     PISSN: 01633767     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (14)

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