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Volumn 21, Issue 20, 2009, Pages 2064-2067

Fabrication of freestanding nanoporous polyethersulfone membranes using organometallic polymer resists patterned by nanosphere lithography

Author keywords

[No Author keywords available]

Indexed keywords

CELLULOSE ACETATES; COLLOIDAL SILICA; ETCH MASK; ETCH RESISTS; FABRICATION PROCESS; FERROCENYLSILANE; NANO-POROUS; NANOSPHERE LITHOGRAPHY; ORGANOMETALLIC POLYMER; POLYETHERSULFONE MEMBRANE; POLYMER CRYSTALLIZATION; POLYMER MEMBRANE; POROUS POLYMERS; SACRIFICIAL LAYER; SILICON SUBSTRATES; THICKNESS VARIATION;

EID: 66249115666     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/adma.200803647     Document Type: Article
Times cited : (37)

References (35)
  • 11


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.