P-type semiconducting Cu2O-CoO thin films prepared by magnetron sputtering

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 21, Issue 4, 2003, Pages 1336-1341

  Suzuki, Shingo ^a   Miyata, Toshihiro ^a   Minami, Tadatsugu ^a  

^a KANAZAWA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; CALCINATION; COBALT COMPOUNDS; COPPER COMPOUNDS; CRYSTAL STRUCTURE; ELECTRIC CONDUCTIVITY; HOLE MOBILITY; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; SEEBECK EFFECT; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DIODES;

AMORPHOUS MULTICOMPONENT OXIDE FILM; COBALT OXIDE; CUPRIC OXIDE; HOLE CONCENTRATION; RADIO FREQUENCY MAGNETRON SPUTTERING; SEMICONDUCTING THIN FILM;

THIN FILMS;

EID: 0043031421     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1580491     Document Type: Article

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