-
1
-
-
65849388554
-
Model-based scanner tuning in a manufacturing environment
-
C.Y. Shih, R.C. Peng, T.C. Chien, et al., "Model-based scanner tuning in a manufacturing environment", Proc. SPIE 7274 (2008).
-
(2008)
Proc. SPIE
, vol.7274
-
-
Shih, C.Y.1
Peng, R.C.2
Chien, T.C.3
-
2
-
-
33745791944
-
Predictive focus exposure modeling (FEM) for full-chip lithography
-
Luoqi Chen, Yu Cao, Hua-yu Liu, Wenjin Shao, Mu Feng, and Jun Ye, "Predictive focus exposure modeling (FEM) for full-chip lithography", Proc. SPIE 6154 (2006).
-
(2006)
Proc. SPIE
, vol.6154
-
-
Chen, L.1
Cao, Y.2
Liu, H.-Y.3
Shao, W.4
Feng, M.5
Ye, J.6
-
3
-
-
35148817496
-
Process window and interlayer aware OPC for the 32-nm node
-
Mark Terry, Gary Zhang, George Lu, et al, "Process window and interlayer aware OPC for the 32-nm node", Proc. SPIE 6520 (2007).
-
(2007)
Proc. SPIE
, vol.6520
-
-
Terry, M.1
Zhang, G.2
Lu, G.3
-
4
-
-
45449106609
-
XLR 600i: Recirculating ring ArF light source for double patterning immersion lithography
-
Vladimir Fleurov, Slava Rokitski, Robert Bergstedt, et al, "XLR 600i: Recirculating Ring ArF Light Source for Double Patterning Immersion Lithography", Proc. SPIE 6924 (2008).
-
(2008)
Proc. SPIE
, vol.6924
-
-
Fleurov, V.1
Rokitski, S.2
Bergstedt, R.3
-
5
-
-
42149137004
-
Fast and accurate laser bandwidth modeling of optical proximity effects
-
Ivan Lalovic, Oleg Kritsun, Joseph Bendik, et al, "Fast and accurate laser bandwidth modeling of optical proximity effects", Proc. SPIE 6730 (2007).
-
(2007)
Proc. SPIE
, vol.6730
-
-
Lalovic, I.1
Kritsun, O.2
Bendik, J.3
-
6
-
-
45549104490
-
Separable OPC models for computational lithography
-
Hua-Yu Liu, Qian Zhao, J. Fung Chen, et al, "Separable OPC models for computational lithography", Proc. SPIE 7028 (2008).
-
(2008)
Proc. SPIE
, vol.7028
-
-
Liu, H.-Y.1
Zhao, Q.2
Chen, J.F.3
-
7
-
-
62649157214
-
Scanner-specific separable models for computational lithography
-
Stefan Hunsche, Xu Xie, Qian Zhao, et al, "Scanner-specific separable models for computational lithography", Proc. SPIE 7122 (2008).
-
(2008)
Proc. SPIE
, vol.7122
-
-
Hunsche, S.1
Xie, X.2
Zhao, Q.3
-
9
-
-
33947167476
-
Laser bandwidth and other sources of focus blur in lithography
-
Timothy Brunner, Daniel Corliss, Shahid Butt, et al, "Laser bandwidth and other sources of focus blur in lithography", J. Microlith., Microfab., Microsyst. 5(4), 2006.
-
(2006)
J. Microlith., Microfab., Microsyst.
, vol.5
, Issue.4
-
-
Brunner, T.1
Corliss, D.2
Butt, S.3
-
10
-
-
62649126102
-
Defining a physically accurate laser bandwidth input for optical proximity correction (OPC) and modeling
-
Ivan Lalovic, Oleg Kritsun, Joseph Bendik, et al, " Defining a physically accurate laser bandwidth input for optical proximity correction (OPC) and modeling", Proc. SPIE 7122 (2008).
-
(2008)
Proc. SPIE
, vol.7122
-
-
Lalovic, I.1
Kritsun, O.2
Bendik, J.3
-
11
-
-
65849140997
-
Laser bandwidth and other sources of focus blur in lithography
-
Peter De Bisschop, Ivan Lalovic, Fedor Trintchouk, "Laser bandwidth and other sources of focus blur in lithography", J. Microlith., Microfab., Microsyst. 7(3), 2008.
-
(2008)
J. Microlith., Microfab., Microsyst.
, vol.7
, Issue.3
-
-
De Bisschop, P.1
Lalovic, I.2
Trintchouk, F.3
|