Patterning of SU-8 resist with Digital Micromirror Device (DMD) maskless lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7274, Issue , 2009, Pages

  Wang, Tao ^a   Quaglio, Marzia ^b   Pirri, Fabrizio ^b   Cheng, Yang Chun ^a   Busacker, David ^c   Cerrina, Franco ^a,c,d  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

^b POLITECNICO DI TORINO   (Italy)

^c University of Wisconsin Madison   (United States)

^d Boston University   (United States)

Author keywords

Lithography; Maskless; Microfluidics; SU 8

Indexed keywords

BIO-MOLECULAR; BIOMEMS; COATED GLASS; DEVELOPMENT STAGES; DIGITAL MICRO-MIRROR DEVICE; LIFT-OFF PROCESS; MASK-LESS LITHOGRAPHY; MASKLESS; METAL FEATURES; MICROFLUIDIC CHANNEL; PDMS MICROFLUIDIC DEVICE; POLYDIMETHYLSILOXANE PDMS; PROCESS FLEXIBILITY; SI WAFER; SINGLE PIXEL; SOFT LITHOGRAPHY; SU-8; SU-8 RESISTS; THICK RESIST; UV LIGHT;

ASPECT RATIO; CHROMIUM; FLUIDIC DEVICES; MICROCHANNELS; MICROFLUIDICS; NANOIMPRINT LITHOGRAPHY; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; SILICONES; TURNAROUND TIME;

LITHOGRAPHY;

EID: 65849096253     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.814831     Document Type: Conference Paper

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