Region-based pattern generation scheme for DMD based maskless lithography

Lecture Notes in Computer Science (including subseries Lecture Notes in Artificial Intelligence and Lecture Notes in Bioinformatics)

Volumn 3926 LNCS, Issue , 2006, Pages 108-119

  Seo, Manseung ^a   Song, Jaesung ^a   An, Changgeun ^b  

^a Tongmyong University   (South Korea)

^b LG Electronics Inc   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

DIGITAL DEVICES; LIGHT SOURCES; MANIPULATORS; PATTERN MATCHING; PROBLEM SOLVING; ROBUSTNESS (CONTROL SYSTEMS);

DIGITAL MICROMIRROR DEVICE (DMD); MASKLESS LITHOGRAPHY; PATTERN GENERATION; REGION BASED PATTERN GENERATION (RPG);

LITHOGRAPHY;

EID: 33749038620     PISSN: 03029743     EISSN: 16113349     Source Type: Book Series    
DOI: 10.1007/11767978_10     Document Type: Conference Paper

References (7)

1. Dudley, D., Duncan, W., Slaughter, J.: Emerging Digital Micromirror Device (DMD) Applications, Proceedings of The International Society for Optical Engineering (2003) 4985
2. Mei W.: Point array maskless Lithography, U.S. Patent No.6,473,237 B2 (2002)
3. Hofling, R., Ahl, E.: ALP : universal DMD controller for metrology and testing, Proceedings of The International Society for Optical Engineering (2003) 5289
4. Jung, S.H.: Maskless Lithography Device, Korea Patent pending, Application Pub. No. 2003- 0059705 written in Korean (2002)
5. Mei W., Kanatake T., Ishikawa, A.: Moving exposure system and method for maskless lithography system, U.S. Patent No. 6,379,867 B1 (2002)
6. Chan, K.F., Feng, Z., Yang, R., Ishikawa, A., Mei, W.: High-resolution maskless lithography, Journal of Microlithography, Microfabrication, and Microsystems 2 (2003) 331-339
7. Kanatake, T.: High Resolution point array, U.S. Patent No.6870604 B2 (2005)