Simulation of DOE fabrication using DMD-based gray-tone lithography

Microelectronic Engineering

Volumn 83, Issue 4-9 SPEC. ISS., 2006, Pages 1012-1016

  Guo, Xiaowei ^a   Du, Jinglei ^a   Guo, Yongkang ^a   Du, Chunlei ^b   Cui, Zheng ^c   Yao, Jun ^d  

^a SICHUAN UNIVERSITY   (China)

^b INSTITUTE OF OPTICS AND ELECTRONICS   (China)

^c RUTHERFORD APPLETON LABORATORY   (United Kingdom)

^d DURHAM UNIVERSITY   (United Kingdom)

Author keywords

Digital gray tone lithography; DMD; DOE; Exposure dose; Imaging model

Indexed keywords

COMPUTER SIMULATION; DIGITAL DEVICES; IMAGE PROCESSING; MICROOPTICS; MICROSTRUCTURE; OPTICAL DEVICES; PHOTOLITHOGRAPHY;

DIGITA MULTI MICROMIRROR DEVICE (DMD); DIGITAL GRAY TONE LITHOGRAPHY; EXPOSURE DOSE; IMAGING MODEL;

DIFFRACTIVE OPTICS;

EID: 33748268133     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.01.100     Document Type: Article

References (10)

1. Hornbeck L.J. Electronic Imaging, EI'97 (1997) 1-14
2. Hornbeck L.J. SPIE 3013 (1997) 27-40
3. Takahashi K., and Setoyama J. J. Inst. Electron. Inf. Commun. Eng. J82-C-11 3 (1999) 92-94
4. Chan K.F., Feng Z., et al. J. Microlith. Microfab. Microsyst. 2 4 (2003) 331-338
5. Croffie1a E., Eiba N., Callan N., et al. SPIE 5256 (2003) 842-850
6. Erdmann L., Deparnay A., Wirth F., et al. SPIE 5347 (2004) 79-84
7. Hornbeck L.J. MRS Bull. 26 4 (2001) 325-327
8. Dudley D. SPIE 4985 (2003) 14-25
9. Monk D.W. Microelectron. Eng. 27 (1995) 489-493
10. Hopkins H.H. Proc. Roy. Soc. Lond. Ser. A. 217 (1953) 408-432