Extremely high aspect ratio alumina transmission nanomasks: Their fabrication and characterization using electron microscopy

Nanotechnology

Volumn 20, Issue 6, 2009, Pages

  Fang, Jing Hua ^a   Spizzirri, Paul ^a   Cimmino, Alberto ^a   Rubanov, Sergey ^b   Prawer, Steven ^a  

^a UNIVERSITY OF MELBOURNE   (Australia)

^b UNIVERSITY OF MELBOURNE   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

ACID ETCHINGS; ANGULAR DOMAINS; BEAM COLLIMATIONS; CIRCULAR CHANNELS; ELECTRON TRANSMISSIONS; HIGH ASPECT RATIOS; LOCAL ORDERS; NANO-MASKS; NANOPOROUS ALUMINA TEMPLATES; NANOTEMPLATES; PERIODIC ARRAYS; PORE DIAMETERS; TWO-STEP ANODIZATION PROCESS;

ELECTRON BEAMS; ELECTRONS; ION BOMBARDMENT; ION IMPLANTATION; PHOTORESISTS; PRESSURE DROP; TRANSMISSION ELECTRON MICROSCOPY;

ASPECT RATIO;

ALUMINUM; NANOCHANNEL;

ARTICLE; CHEMICAL STRUCTURE; COMPOSITE MATERIAL; ELECTRON BEAM; MEMBRANE STRUCTURE; NANOFABRICATION; OXIDATION; PRIORITY JOURNAL; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY;

EID: 65549148664     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/20/6/065706     Document Type: Article

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